@article{CTT100672803,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma},
  journal = {Japanese Journal of Applied Physics},
  year = 2009,
}

@article{CTT100672892,
  author = {Akihiro Matsutani and Hideo Ohtsuki and FUMIO KOYAMA},
  title = {Iodine Solid Source Inductively Coupled Plasma Etching of InP},
  journal = {Japanese Journal of Applied Physics},
  year = 2005,
}

@inproceedings{CTT100931314,
  author = {飯嶋 航大 and 谷口 公太 and 大槻秀夫 and 神野 莉衣奈 and 遠西美重 and 松谷晃宏 and 太田 泰友 and 岩本 敏},
  title = {α-Ga2O3 導波路作製に向けたPECVD 成膜 a-C:H 膜のAr プラズマエッチング耐性評価},
  booktitle = {},
  year = 2025,
}

@inproceedings{CTT100661715,
  author = {松谷晃宏 and 大槻 秀夫 and 小山二三夫 and 伊賀健一},
  title = {Cl2/Xe誘導結合型プラズマ(ICP）によるInPの垂直平滑ドライエッチング},
  booktitle = {},
  year = 1999,
}