@article{CTT100932850,
  author = {Hiroyoshi Tanabe and Masayuki Shimoda and Atsushi Takahashi},
  title = {Rigorous electromagnetic simulator for extreme ultraviolet lithography and convolutional neural network reproducing electromagnetic simulations},
  journal = {Journal of Micro/Nanopatterning, Materials and Metrology (JM3)},
  year = 2025,
}

@article{CTT100917505,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Weakly guiding approximation of a three dimensional waveguide model for extreme ultraviolet lithography simulation},
  journal = {Journal of the Optical Society of America A},
  year = 2024,
}

@article{CTT100907695,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula},
  journal = {Journal of Micro/Nanopattern. Mater. Metrol (JM3)},
  year = 2024,
}

@article{CTT100892427,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns},
  journal = {Journal of Micro/Nanopatterning, Materials and Metrology (JM3)},
  year = 2023,
}

@article{CTT100882679,
  author = {Hiroyoshi Tanabe and Atsushi Takahashi},
  title = {Data augmentation in extreme ultraviolet lithography simulation using convolutional neural network},
  journal = {Journal of Micro/Nanopatterning, Materials and Metrology (JM3)},
  year = 2022,
}

@article{CTT100862467,
  author = {Hiroyoshi Tanabe and Shimpei Sato and Atsushi Takahashi},
  title = {Fast EUV lithography simulation using convolutional neural network},
  journal = {Journal of Micro/Nanopatterning, Materials and Metrology (JM3)},
  year = 2021,
}

@inproceedings{CTT100937711,
  author = {杉山萌 and 田邊容由 and 下田将之 and 高橋篤司},
  title = {EUVリソグラフィシミュレーション高速化のための CNN学習用カーブリニアマスクパターン生成},
  booktitle = {DAシンポジウム2025 論文集},
  year = 2025,
}

@inproceedings{CTT100931742,
  author = {Hiroyoshi Tanabe and Atsushi Takahashi},
  title = {Absorber dependence of M3D overlay errors in high-NA and hyper-NA EUV lithography},
  booktitle = {Proc. SPIE},
  year = 2025,
}

@inproceedings{CTT100911340,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Pre-training CNN for fast EUV lithography simulation including M3D effects},
  booktitle = {Proc. SPIE 12954, DTCO and Computational Patterning III, 129540I},
  year = 2024,
}

@inproceedings{CTT100906910,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula},
  booktitle = {Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500D},
  year = 2023,
}

@inproceedings{CTT100891154,
  author = {Hiroyoshi Tanabe and Akira Jinguji and Atsushi Takahashi},
  title = {Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns},
  booktitle = {Proc. SPIE 12495, Advanced Lithography + Patterning 2023, 124951J},
  year = 2023,
}

@inproceedings{CTT100880925,
  author = {Hiroyoshi Tanabe and Atsushi Takahashi},
  title = {Data augmentation in EUV lithography simulation based on convolutional neural network},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100862469,
  author = {Hiroyoshi Tanabe},
  title = {Classification of EUV masks based on the ratio of the complex refractive index k/(1-n)},
  booktitle = {Proceedings of SPIE},
  year = 2021,
}

@inproceedings{CTT100861932,
  author = {Tahsin Shameem and Shimpei Sato and Atsushi Takahashi and Hiroyoshi Tanabe and Yukihide Kohira and Chikaaki Kodama},
  title = {A Fast LUT Based Point Intensity Computation for OPC Algorithm},
  booktitle = {Proc. the 23rd Workshop on Synthesis And System Integration of Mixed Information technologies (SASIMI 2021)},
  year = 2021,
}

@inproceedings{CTT100862468,
  author = {Hiroyoshi Tanabe and Shimpei Sato and Atsushi Takahashi},
  title = {Fast 3D lithography simulation by convolutional neural network},
  booktitle = {Proc. SPIE 11614, Design-Process-Technology Co-optimization XV 2021, 116140M},
  year = 2021,
}

@inproceedings{CTT100886201,
  author = {Hiroyoshi Tanabe and Shimpei Sato and Atsushi Takahashi},
  title = {Fast 3D lithography simulation by convolutional neural network: POC study},
  booktitle = {Proc. SPIE 11518, Photomask Technology 2020, 115180L},
  year = 2020,
}

@inproceedings{CTT100862466,
  author = {Hiroyoshi Tanabe},
  title = {Fast 3D lithography simulation by convolutional neural network: POC study},
  booktitle = {Proc. SPIE 11518, Photomask Technology 2020, 115180L},
  year = 2020,
}

@inproceedings{CTT100834856,
  author = {Tahsin Binte Shameem and Atsushi Takahashi and Hiroyoshi Tanabe and Yukihide Kohira and Chikaaki Kodama},
  title = {A Fast Look Up Table Based Lithography Simulator with SOCS Model for OPC Algorithm},
  booktitle = {Proc. DA Symposium 2020, IPSJ Symposium Series},
  year = 2020,
}