@article{CTT100833073,
  author = {Yoshiro Kumagai and Satoshi Fukuyama and Hiroki Tonegawa and Kizashi Mikami and Kodai Hirose and Kanta Tomizawa and Kensuke Ichikawa and Masahiro Watanabe},
  title = {Negative differential resistance of CaF<sub>2</sub>/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process},
  journal = {Japanese Journal of Applied Physics},
  year = 2020,
}

@inproceedings{CTT100833064,
  author = {Yoshiro Kumagai and Satoshi Fukuyama and Hiroki Tonegawa and Kizashi Mikami and Kodai Hirose and Kanta Tomizawa and Keisuke Ichikawa and Masahiro Watanabe},
  title = {Negative Differential Resistance in CaF<sub>2</sub>/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100833047,
  author = {市川研佑 and 利根川啓希 and 廣瀬皓大 and 三上萌 and 福山聡史 and 熊谷佳郎 and 渡辺正裕},
  title = {金属をエミッタとするシリコン／フッ化物多重障壁共鳴トンネルダイオードの理論解析},
  booktitle = {},
  year = 2019,
}