@article{CTT100647421, author = {ダリューシュザデ and Takashi Kanda and 山下晃司 and Kuniyuki KAKUSHIMA and Hiroshi Nohira and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Capacitance-Voltage Characterization of La2O3 Metal-Oxide-Semiconductor Structures on Ino.53Ga.0.47As Substrate with Different Surface Treatment Methods}, journal = {Japanese Journal of Applied Physics}, year = 2011, } @article{CTT100647422, author = {来山大祐 and 久保田透 and Tomotsune Koyanagi and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {[ 183] D. Kitayama, T. Kubota, T. Koyonagi, K. Kakushima, P. Ahmet, K. Tsutsui, A. Nishiyama, N. Sugii, K. Natori, T. Hattori, H. Iwai, “Silicate Reaction Control at Lanthanum Oxide and Silicon Interface for Equivalent Oxide Thickness of 0.5nm* Adjustment of Amount of Residual Oxygen Atoms in Metal Layer”, Japanese Journal of Applied Physics, Vol.50, No.10, pp.10PA05-1-5, October, 2011}, journal = {Japanese Journal of Applied Physics}, year = 2011, } @article{CTT100647417, author = {Miyuki Kouda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Rare Earth Oxide Capping Effect on La2O3 Gate Dielectrics for Equivalent Oxide Thickness Scaling toward 0.5nm}, journal = {Japanese Journal of Applied Physics}, year = 2011, } @article{CTT100626839, author = {来山大祐 and Tomotsune Koyanagi and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Effect of thin Si insertion at metal gate/high-k interface on electrical characteristics of MOS device with La2 O3}, journal = {Microelectronic Engineering}, year = 2011, } @article{CTT100626838, author = {ダリューシュザデ and Kuniyuki KAKUSHIMA and Takashi Kanda and Y.C.Lin and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and E.Y.Chang and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Improving electrical characteristics of W/HfO2/Ino.53Gao.47As gate stacks by altering deposition techniques}, journal = {Microelectronic Engineering}, year = 2011, } @article{CTT100621281, author = {DARYOUSH ZADEH and Soshi Sato and Kuniyuki KAKUSHIMA and A. Srivastava and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and C.K. Sarkar and HIROSHI IWAI}, title = {Effects of La2O3 incorporation in HfO2 gated nMOSFETs on low-frequency noise}, journal = {Microelectronics Reliability}, year = 2011, } @inproceedings{CTT100830559, author = {Youhei Miyata and Jun Kanehara and Hiroshi Nohira and Yudai Izumi and Takayuki Muro and Toyohiko Kinoshita and Parhat Ahmet and Kuniyuki Kakushima and Kazuo Tsutsui and Takeo Hattori and Hiroshi Iwai}, title = {Soft X-ray Photoelectron Spectroscopy on Chemical Bonding States of Boron Doped in Si Fin Structures}, booktitle = {}, year = 2011, } @inproceedings{CTT100830554, author = {Jun Kanehara and Youhei Miyata and Hiroshi Nohira and Yudai Izumi and Takayuki Muro and Toyohiko Kinoshita and Parhat Ahmet and Kuniyuki Kakushima and Kazuo Tsutsui and Takeo Hattori and Hiroshi Iwai}, title = {Chemical Bonding States of As in Si Shallow Junctions Detected by Soft X-ray Photoelectron Spectroscopy and their Profiles}, booktitle = {}, year = 2011, } @inproceedings{CTT100830555, author = {Keita Takahashi and Yuji Hayashi and Ryosuke Kayanuma and Kazuo Tsutsui}, title = {Leakage Current Control of Fluoride Ultra-thin Films Grown on Ge Substrates}, booktitle = {}, year = 2011, } @inproceedings{CTT100830557, author = {K. Kakushima and J. Kanehara and Y. Izumi and T. Muro and T. Kinoshita and P. Ahmet and K. Tsutsui and T. Hattori and H. Iwai}, title = {Concentration Depth Profiling of Heavily Doped Boron at and near SiO2/Si Interface by Angle-resolved Soft X-ray Photoelectron Spectroscopy}, booktitle = {}, year = 2011, } @inproceedings{CTT100830561, author = {Y. Y. Illarionov and M. I. Vexler and S. M. Suturin and V. V. Fedorov and N. S. Sokolov and K. Tsutsui and K. Takahashi}, title = {Electron Tunneling in MIS Capacitors with MBE Grown Fluoride Layers on Si(111) and Ge(111): Role of Transvers Momentum Conservation}, booktitle = {}, year = 2011, } @inproceedings{CTT100622712, author = {Takamasa Kawanago and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Metal Inserted Poly-Si Stacks with La2O3 Gate Dielectrics for Scaled EOT and VFB Control by Oxygen Incorporation}, booktitle = {}, year = 2011, } @inproceedings{CTT100623969, author = {Ahmet Parhat and 来山大祐 and 金田翼 and 鈴木 拓也 and Tomotsune Koyanagi and Miyuki Kouda and マイマイティ マイマイティレャアティ and Takamasa Kawanago and Kuniyuki KAKUSHIMA and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {TiN/W/La2O3 /Si High-k Gate Stack for EOT below o.5nm}, booktitle = {}, year = 2011, } @inproceedings{CTT100623983, author = {Ahmet Parhat and 来山大祐 and 金田翼 and 鈴木 拓也 and Tomotsune Koyanagi and Miyuki Kouda and マイマイティ マイマイティレャアティ and Takamasa Kawanago and Kuniyuki KAKUSHIMA and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Effects of Metal Layer Insertion on EOT scaling in TiN/Metal/ La2O3 Si High –k Gate Stacks}, booktitle = {}, year = 2011, } @inproceedings{CTT100623994, author = {C. Dou and 向井 弘樹 and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Resistive switching behaviors of ReRAM having W/CeO2/Si/TiN structure}, booktitle = {}, year = 2011, } @inproceedings{CTT100627777, author = {田中 祐樹 and 川那子高暢 and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {シリコン基板上に堆積したナノカーボン薄膜への高温短時間アニーリングの影響}, booktitle = {}, year = 2011, } @inproceedings{CTT100627781, author = {関 拓也 and 来山大祐 and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {High-k/Si 直接接合構造における界面準位の定量評価について}, booktitle = {}, year = 2011, } @inproceedings{CTT100628207, author = {Kamale Tuokedaerhan and 金田翼 and マイマイティ マイマイティレャアティ and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {La2O3/n-Si 構造に対するPost Deposition Annealの電気特性への影響}, booktitle = {}, year = 2011, } @inproceedings{CTT100628208, author = {常石佳奈 and 来山大祐 and 幸田みゆき and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {W/Tm2O3/n-Si構造キャパシタの電気特性におけるTm2O3膜厚依存性}, booktitle = {}, year = 2011, } @inproceedings{CTT100628214, author = {鈴木佑哉 and 細井隆司 and ダリューシュザデ and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {high-k/In0.53Ga0.47As MOS キャパシタの容量-電圧特性の解析}, booktitle = {}, year = 2011, } @inproceedings{CTT100628215, author = {松本一輝 and 小山将央 and 呉研 and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {酸化膜被覆型SiナノワイヤおよびSi Fin構造におけるNiシリサイド成長機構の検討}, booktitle = {}, year = 2011, } @inproceedings{CTT100628216, author = {角嶋邦之 and 金原潤 and 筒井一生 and 服部健雄 and 岩井洋}, title = {高濃度ボロンドープ飼料の角度分解X線光電子分光による濃度分布解析}, booktitle = {}, year = 2011, } @inproceedings{CTT100628219, author = {宮田陽平 and 金原潤 and 難波覚 and 三角元力 and 筒井一生 and 野平博司 and 室隆桂之 and 木下豊彦 and 角嶋邦之 and パールハットアヘメト and 服部健雄 and 岩井洋}, title = {軟X線光電子分光法を用いたFin構造中の不純物化学結合状態分析}, booktitle = {}, year = 2011, } @inproceedings{CTT100628814, author = {金原潤 and 宮田陽平 and 秋田洸平 and 筒井一生 and 野平博司 and 室隆桂之 and 木下豊彦 and パールハットアヘメト and 角嶋邦之 and 服部健雄 and 岩井洋}, title = {Si中に極浅ドープされたAsの軟X線光電子分光による化学結合状態の検出とその深さ方向分布}, booktitle = {}, year = 2011, } @inproceedings{CTT100628830, author = {吉原 亮 and 角嶋邦之 and パールハットアヘメト and 中塚理 and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {Ni/Si積層から形成されるNiシリサイドのショットキーダイオードの電流特性}, booktitle = {}, year = 2011, } @inproceedings{CTT100628833, author = {LiWei and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {コンダクタンス法による立体チャネルを有するMOSキャパシタの界面準位密度の評価}, booktitle = {}, year = 2011, } @inproceedings{CTT100628847, author = {叶真一 and MokhammadSholihul Hadi and 竇春萌 and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {希土類酸化物(CeOX)を用いたMIM構造の抵抗スイッチング特性}, booktitle = {}, year = 2011, } @inproceedings{CTT100628848, author = {細田倫央 and 李映勲 and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 岩井洋}, title = {矩形断面SiナノワイヤMOSFETにおけるフォノン散乱に制限された移動度のサイズ依存性}, booktitle = {}, year = 2011, } @inproceedings{CTT100654662, author = {Miyuki Kouda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and Akira Nishiyama and Nobuyuki Sugii and Kenji Natori and takeo hattori and HIROSHI IWAI}, title = {Electrical Properties of Rare-Earth oxides and La2O3 Stacked Gate Dielectrics}, booktitle = {ECS Transactions}, year = 2011, } @inproceedings{CTT100654666, author = {Miyuki Kouda and Kuniyuki KAKUSHIMA and パールハットアヘメト and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and Kenji Natori and takeo hattori and HIROSHI IWAI}, title = {Electrical Properties of Rare-Earth oxides and La2O3 Stacked Gate Dielectrics}, booktitle = {ECS Transactions}, year = 2011, } @inproceedings{CTT100654916, author = {竇春萌 and Soshi Sato and Kuniyuki KAKUSHIMA and パールハットアヘメト and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and Kenji Natori and takeo hattori and HIROSHI IWAI}, title = {Si nanowire FET with asymmetric channel}, booktitle = {}, year = 2011, } @inproceedings{CTT100628819, author = {田村雄太 and 角嶋邦之 and 中塚 理 and パールハットアヘメト and 筒井一生 and 西山彰 and 杉井信之 and 名取研二 and 服部健雄 and 岩井洋}, title = {NiとSiの積層薄膜によって形成したシリサイドのシート抵抗に対する熱処理温度の影響}, booktitle = {}, year = 2011, } @inproceedings{CTT100622593, author = {Miyuki Kouda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Rare earth oxide capping effect on La2O3 gate dielectrics toward EOT of 0.5nm}, booktitle = {}, year = 2011, } @inproceedings{CTT100622594, author = {Miyuki Kouda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Preparation and electrical characterization of CeO2 films for gate dielectrics application: comparative study of CVD and ALD processes}, booktitle = {}, year = 2011, } @inproceedings{CTT100622598, author = {ダリューシュザデ and Takashi Kanda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Effects of In0.53Ga0.47As Surface Preparation on MOS Device Electrical Characterization}, booktitle = {}, year = 2011, } @inproceedings{CTT100622683, author = {Naoto Shigemori and Soshi Sato and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {An effective suppression process for Ni silicide enchroachment into Si nanowire}, booktitle = {}, year = 2011, } @inproceedings{CTT100622684, author = {小山将央 and Naoto Shigemori and Hideaki Arai and Soshi Sato and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Lateral encroachment of Ni silicide into silicon nanowire}, booktitle = {}, year = 2011, } @inproceedings{CTT100622685, author = {中島一裕 and Soshi Sato and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Interface State Density Measurement of Three Dimensional Silicon Structures by Charge Pumping Method}, booktitle = {}, year = 2011, } @inproceedings{CTT100622686, author = {Takamasa Kawanago and 鈴木 拓也 and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {An effective process for oxygen defect suppression for La-based oxide gate dielectric}, booktitle = {}, year = 2011, } @inproceedings{CTT100622703, author = {金田翼 and Miyuki Kouda and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Effect of rare earth oxide capping for La-based gate oxides}, booktitle = {}, year = 2011, } @inproceedings{CTT100622704, author = {マイマイティ マイマイティレャアティ and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and HIROSHI IWAI}, title = {Remote-surface-roughness scattering-limited electron, mobility in ultrathin high-k gate stacked MOSFETs}, booktitle = {}, year = 2011, } @inproceedings{CTT100622706, author = {来山大祐 and 久保田 透 and Tomotsune Koyanagi and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Precise Control of Silicate Reaction with La2O3 Gate Dielectrics towards Equivalent Oxide Thickness of 0.5 nm}, booktitle = {}, year = 2011, } @inproceedings{CTT100622711, author = {Takashi Kanda and ダリューシュザデ and Y. C. Lin and Kuniyuki KAKUSHIMA and Ahmet Parhat and KAZUO TSUTSUI and 西山彰 and Nobuyuki Sugii and E.Y. Chang and KENJI NATORI and takeo hattori and HIROSHI IWAI}, title = {Annealing Effect on the Electrical Properties of La2O3/InGaAs MOS Capacitors}, booktitle = {}, year = 2011, } @misc{CTT100663668, author = {AHMETPARHAT and マイマイティ マイマイティレシャティ and 岩井洋 and 服部健雄 and 筒井一生 and 角嶋邦之}, title = {半導体素子}, howpublished = {公開特許}, year = 2013, month = {}, note = {特願2011-285538(2011/12/27), 特開2013-135135(2013/07/08)} }