@inproceedings{CTT100766273,
  author = {小平行秀 and 児玉親亮 and 松井知己 and 高橋篤司 and 野嶋茂樹 and 田中聡},
  title = {マスク位置ずれに対する耐性を持つLELECUTトリプルパターニングのためのマスク割り当て手法},
  booktitle = {次世代リソグラフィワークショップ予稿集 (NGL2015)},
  year = 2015,
}

@inproceedings{CTT100684777,
  author = {Yukihide Kohira and Chikaaki Kodama and Tomomi Matsui and Atsushi Takahashi and Shigeki Nojima and Satoshi Tanaka},
  title = {Yield-aware mask assignment using positive semidefinite relaxation in LELECUT triple patterning},
  booktitle = {Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 94270B},
  year = 2015,
}

@inproceedings{CTT100684776,
  author = {Yukihide Kohira and Tomomi Matsui and Yoko Yokoyama and Chikaaki Kodama and Atsushi Takahashi and Shigeki Nojima and Satoshi Tanaka},
  title = {Fast Mask Assignment using Positive Semidefinite Relaxation in LELECUT Triple Patterning Lithography},
  booktitle = {Proc. Asia and South Pacific Design Automation Conference 2015 (ASP-DAC 2015)},
  year = 2015,
}