発明者,発明の名称,種別,状態,出願人,出願日,出願番号,公開日,公開番号,登録日,登録番号
"川崎宏治,青柳克信,北野　雅裕,池田　善和","真空加熱プレス機","特許","登録","国立大学法人東京工業大学, 北野精機株式会社","2007/01/30","特願2007-018879","2008/08/14","特開2008-183587","特許第5196795号","2013/02/15"
"青柳克信,川崎　宏治,武内　道一","窒化物系深紫外発光素子およびその製造方法","特許","公開","国立大学法人東京工業大学, 独立行政法人理化学研究所","2006/03/20","特願2007-510466","2006/10/05","特再表2006-104063",,
"川崎宏治,青柳克信,歌野　和弘","レーザーリフトオフ法およびレーザーリフトオフ装置","特許","登録","国立大学法人東京工業大学, 西進商事株式会社","2005/11/28","特願2005-342734","2007/06/14","特開2007-149988","特許第4883991号","2011/12/16"
"川崎　宏治,青柳克信,細野秀雄","AｌGaN系深紫外発光素子およびその製造方法","特許","公開","国立大学法人東京工業大学","2005/03/28","特願2005-093028","2006/10/12","特開2006-278554",,
"青柳克信,川崎宏治,武内　道一(,木下　亨","窒化物半導体の製造方法","特許","登録","国立大学法人東京工業大学, 独立行政法人理化学研究所, 株式会社トクヤマ","2005/03/28","特願2005-090952","2006/10/12","特開2006-278402","特許第4544628号","2010/07/09"
"青柳克信,川崎宏治,武内道一","半導体成長用基板および半導体膜の製造方法","特許","公開","国立大学法人東京工業大学, 独立行政法人理化学研究所, 株式会社トクヤマ","2004/12/24","特願2004-374976","2006/07/13","特開2006-185962",,