発明者,発明の名称,種別,状態,出願人,出願日,出願番号,公開日,公開番号,登録日,登録番号
"篠崎和夫,脇谷尚樹,長田　晃","高速ミーリング加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆切削工具およびその製造方法","特許","登録","国立大学法人東京工業大学, 三菱マテリアル株式会社","2007/09/19","特願2007-241962","2009/04/09","特開2009-072838","特許第5035980号","2012/07/13"
"篠崎和夫,脇谷尚樹,長田　晃","高速ミーリング加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆切削工具およびその製造方法","特許","登録","国立大学法人東京工業大学, 三菱マテリアル株式会社","2007/09/19","特願2007-241961","2009/04/09","特開2009-072837","特許第5035979号","2012/07/13"
"篠崎和夫,高　鉉龍,脇谷尚樹,木口賢紀,近藤　正雄,丸山　研二","ペロブスカイト型酸化物質薄膜の成膜方法および積層体","特許","公開","国立大学法人東京工業大学, 富士通株式会社","2007/09/11","特願2007-236002","2009/04/02","特開2009-070926",,
"篠崎和夫,脇谷尚樹,長田　晃","高速切削加工で硬質被覆層がすぐれた耐チッピング性と耐摩耗性を発揮する表面被覆切削工具およびその製造方法","特許","登録","国立大学法人東京工業大学, 三菱マテリアル株式会社","2007/03/19","特願2007-071120","2008/10/02","特開2008-229759","特許第4968674号","2012/04/13"
"田中順三,脇谷尚樹,篠崎和夫,生駒　俊之","生体親和性の高いアパタイト被覆磁性ナノ粒子","特許","登録","国立大学法人東京工業大学, 独立行政法人物質・材料研究機構","2006/11/30","特願2006-323621","2008/06/19","特開2008-137911","特許第5154785号","2012/12/14"
"篠崎和夫,脇谷尚樹,クロス　ジェフリー　スコット","不揮発性半導体記憶装置及びその書き込み方法","特許","公開","国立大学法人東京工業大学, 富士通株式会社","2005/09/26","特願2005-277712","2007/04/05","特開2007-088349",,