Quantum chemical study on the oxidation process of a hydrogen terminated Si surface | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Quantum chemical study on the oxidation process of a hydrogen terminated Si surface

Author

Japanese:	中村一隆.
English:	KAZUTAKA NAKAMURA.

Language

English

Journal/Book name

Japanese:
English:	J. Chem. Phys.

Volume, Number, Page

Vol. 109 pp. 1495

Published date

1998

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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