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Title
Japanese: 
English:Effects of Bias Power on EEPFs near the Substrate in Argon ICP Measured by a Langmuir Probe 
Author
Japanese: 叶宇晨, 土居謙太, 清田哲司, 島谷和希, 羽生陽向, 櫻井彩貴, 山下雄也, 根津篤, 赤塚洋.  
English: Yuchen Ye, Kenta Doi, Tetsuji Kiyota, Kazuki Shimatani, Hinata Hanyu, Ayaki Sakurai, Yuya Yamashita, Atsushi Nezu, Hiroshi Akatsuka.  
Language English 
Journal/Book name
Japanese: 
English:Proc. DPS2025 
Volume, Number, Page        
Published date Nov. 13, 2025 
Publisher
Japanese:応用物理学会プラズマエレクトロニクス分科会 
English:Division of Plasma Electronics, Japan Society of Applied Physics 
Conference name
Japanese: 
English:The 46th International Symposium on Dry Process (DPS2025) 
Conference site
Japanese:松山 
English:Matsuyama 
Official URL https://www.dry-process.org/2025/poster_program.html
 
Abstract Electron energy probability functions (EEPFs) were measured 12 mm above the substrate across the diameter of the argon ICP chamber using a single Langmuir probe under applied bias power. The EEPFs exhibited reduced low-energy components and enhanced high-energy tails under 12.5 MHz RF bias, evolving toward a one-temperature Maxwellian profile.

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