Development of PS-PMMA Block Copolymers Incorporating Poly(<i>n</i>-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment

Publication Information

Title

Japanese:	Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment
English:	Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment

Author

Japanese:	WangHsi-Chih, 瀬下武広, Takahiro Dazai, Kazufumi Sato, 畠山歓, Yuta Nabae, 早川晃鏡.
English:	Hsi-Chih Wang, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama, Yuta Nabae, Teruaki Hayakawa.

Language

English

Journal/Book name

Japanese:	Journal of Photopolymer Science and Technology
English:	Journal of Photopolymer Science and Technology

Volume, Number, Page

Vol. 38 No. 3 pp. 223-230

Published date

June 2025

Publisher

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Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI