"²“¡•ä”g,ŒF’J‰À˜Y,•yàVŠ¨‘¾,‹àŽq‘ñŠC,“n•Ó³—T","Si/CaF2 pŒ^ŽOdá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ÌŽº‰·”÷•ª•‰«’ïR“Á«","‘æ68‰ñ‰ž—p•¨—Šw‰ït‹GŠwpu‰‰‰ï","‘æ68‰ñ‰ž—p•¨—Šw‰ït‹GŠwpu‰‰‰ï u‰‰—\eW (2021 ƒIƒ“ƒ‰ƒCƒ“ŠJÃ)",,,,"p. 12-155",2021,Mar. "Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",," SIIE03-1",2020,Apr. "²“¡ •ä”g,ŒF’J ‰À˜Y,ŽOã –G,—˜ªì Œ[Šó,œA£ á©‘å,•yàV Š¨‘¾,‹àŽq ‘ñŠC,“n•Ó ³—T","Si/CaF2 pŒ^ŽOdá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ÌŽº‰·”÷•ª•‰«’ïR“Á«","‘æ67‰ñ‰ž—p•¨—Šw‰ït‹GŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 11-139",2020,Mar. "‹àŽq ‘ñŠC,ŒF’J ‰À˜Y,œA£ á©‘å,—˜ªìŒ[Šó,ŽOã –G,•yàV Š¨‘¾,²“¡•ä”g,“n•Ó³—T","CaF2/Si/CaF2‹¤–ƒgƒ“ƒlƒ‹—ÊŽqˆäŒË\‘¢‚ð—p‚¢‚½’ïRƒXƒCƒbƒ`ƒ“ƒO“Á«‚Ì—˜_‰ðÍ","‘æ67‰ñ‰ž—p•¨—Šw‰ït‹GŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 11-140",2020,Mar. "Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Keisuke Ichikawa,Masahiro Watanabe","Negative Differential Resistance in CaF2/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process","32nd International Microprocesses and Nanotechnology Conference (MNC2019)",,"The Japan Society of Applied Physics",,,,2019,Oct. "—˜ªì Œ[Šó,ŒF’J ‰À˜Y,ŽOã –G,œA£ á©‘å,•yàV Š¨‘¾,‹àŽq ‘ñŠC,²“¡ •ä”g,“n•Ó ³—T","Si/CaF2ŽOdá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚Ì‚ƒs[ƒN“d—¬–§“x‚ð—L‚·‚鎺‰·”÷•ª•‰«’ïR“Á«","‘æ80‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 12-340",2019,Sept. "•yàV Š¨‘¾,ŒF’J ‰À˜Y,—˜ªì Œ[Šó,ŽOã –G,œA£ á©‘å,‹àŽq ‘ñŠC,²“¡ •ä”g,“n•Ó ³—T","CaF2/Si/SiO2“ñdá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ÌŽº‰·”÷•ª•‰«’ïR“Á«","‘æ80‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 12-341",2019,Sept. "ŽOã –G,ŒF’J ‰À˜Y,œA£ á©‘å,•yàV Š¨‘¾,—˜ªì Œ[Šó,‹àŽq ‘ñŠC,²“¡ •ä”g,“n•Ó ³—T","Œ´Žq‘w”––ŒCaF2/Siƒwƒeƒ\‘¢‚ð—p‚¢‚½ƒz[ƒ‹‹ì“®‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ÌŽº‰·”÷•ª•‰«’ïR“Á«","‘æ80‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 12-342",2019,Sept. "œA£ á©‘å,ŒF’J ‰À˜Y,—˜ªì Œ[Šó,•yàV Š¨‘¾,‹àŽq ‘ñŠC,²“¡ •ä”g,“n•Ó ³—T","Si/CaF2ƒoƒCƒ|[ƒ‰“ñdá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ÌŽº‰·”÷•ª•‰«’ïR“Á«","‘æ80‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï",,"‰ž—p•¨—Šw‰ï",,,"p. 12-343",2019,Sept.