"Hsi-Chih Wang,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","Development of PS-PMMA Block Copolymers Incorporating Poly(<i>n</i>-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment",,"Journal of Photopolymer Science and Technology",,"Vol. 38","No. 3","pp. 223-230",2025,June