"Shinsuke Maekawa,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly",,"Nature Communications",,"Vol. 15","No. 1","pp. 5671",2024,July
"Lei Dong,Rin Odashima,Takehiro Seshimo,Yuta Nabae,Teruaki Hayakawa","Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers",,"Journal of Photopolymer Science and Technology",,"Vol. 32","No. 6","pp. 817-822",2019,Nov.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.