"Hsi-Chih Wang,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","Development of PS-PMMA Block Copolymers Incorporating Poly(<i>n</i>-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment",,"Journal of Photopolymer Science and Technology",,"Vol. 38","No. 3","pp. 223-230",2025,June
"Ryota Uehara,Shinsuke Maekawa,Takehiro Seshimo,Sugawara Ryutaro,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA",,"Journal of Photopolymer Science and Technology",,"Vol. 38","No. 3","pp. 205-210",2025,June
"Shinsuke Maekawa,Lander Verstraete,Hyo Seon Suh,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","High-Fidelity Directed Self-Assembly Using Higher-chi Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features",,"Advanced Functional Materials","John Wiley & Sons, Ltd","Vol. n/a","No. n/a","pp. 2421066",2025,Jan.
"Riku Mizusaki,Shinsuke Maekawa,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama-Sato,Yuta Nabae,Teruaki Hayakawa","Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella",,"RSC Applied Interfaces","RSC","Vol. 2","No. 1","pp. 74-81",2024,Aug.
"Shinsuke Maekawa,Takehiro Seshimo,Takahiro Dazai,Kazufumi Sato,Kan Hatakeyama,Yuta Nabae,Teruaki Hayakawa","Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly",,"Nature Communications",,"Vol. 15","No. 1","pp. 5671",2024,July
"Lei Dong,Rin Odashima,Takehiro Seshimo,Yuta Nabae,Teruaki Hayakawa","Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers",,"Journal of Photopolymer Science and Technology",,"Vol. 32","No. 6","pp. 817-822",2019,Nov.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.
"Takehiro Seshimo","Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography",,,,,,,2016,Mar.