"Yu Nakagawa,Tomohito Ogura,Tomoya Higashihara,Mitsuru Ueda","Optically transparent sulfur-containing semi-alicyclic polyimide with high refractive index","240th ACS National Meeting","240th ACS National Meeting, Preprint",,,,,2010,Aug.
"Tomohito Ogura,tomoya higashihara,mitsuru ueda","Pattern formation of polyimide by using photosensitive polybenzoxazole as a top layer",,"European Polymer Journal",,"Vol. 46","No. 7","pp. 1576-1581",2010,Aug.
"Tomohito Ogura,tomoya higashihara,mitsuru ueda","Development of Photosensitive Poly(hydroximide) with high refractive index",,"J. Photopolym. Sci.•Technol.",,"Vol. 23",,"pp. 515-520",2010,Aug.
"Masaya Sugiyama,Tomohito Ogura,tomoya higashihara,mitsuru ueda","Development of a Chemically Amplified Photosensitive Polyimide Based on Poly(amic acid), a Dosslution Inhibitor, and a Photoacid Generator",,"J. Photopolym. Sci.•Technol.",,"Vol. 23",,"pp. 483-488",2010,Aug.
"Yu Nakagawa,Tomohito Ogura,tomoya higashihara,mitsuru ueda","Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index",,,,"Vol. 39",,"pp. 392-393",2010,Aug.
"Tomohito Ogura,tomoya higashihara,mitsuru ueda","Low-CTE photosensitive polyimide based on semialicyclic poly(amic acid) and photobase generator.",,"J. Polym. Sci. Part-A, Polym. Chem.",,"Vol. 48",,"pp. 1317-1323",2010,Apr.
"Tomohito Ogura","Development of photosensitive polyimide and polybenzoxazole",,,,,,,2010,Mar.
"Tomohito Ogura,Tomoya Higashihara,Mitsuru Ueda","Synthesis of dissolution inhibitor for photosensitive polybenzoxazole","238th ACS National Meeting",,,,,,2009,Aug.
"Keita Endo,Tomohito Ogura,T. Higashihara,mitsuru ueda","A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator",,"Polym. J.",,"Vol. 41",,"pp. 808-809",2009,July
"Tomohito Ogura,; Tomoya Higashihara,mitsuru ueda","Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator",,,,"Vol. 22",,"pp. 429-436",2009,July
"Tomohito Ogura,Tomoya Higashihara,Mitsuru Ueda","Direct patterning of poly(amic acid) and low-temperature imidization using a crosslinker, a photoacid generator, and a thermobase generator",,"J. Polym. Sci., Part A: Polym. Chem.",,"Vol. 47","No. 13","pp. 3362-3369",2009,May
"Jin-gang LIU,Yasuhiro NAKAMURA,Tomohito OGURA,Yuji SHIBASAKI,Shinji ANDO,mitsuru ueda","Optically Transparent Sulfur-Containing Polyimide-TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)-TiO2 Nanocomposite Film",,"Chemistry of Materials","American Chemical Society","Vol. 20","  Issue 1","pp. 273-281",2008,Dec.
"tomohito ogura,katsuhisa mizoguchi,mitsuru ueda","Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator",,"J. Photopolym. Sci.•Technol.",,"Vol. 21",,"pp. 125-130",2008,