"相羽 誉礼,小田 三都郎,大岡 千洋,安藤 慎治,芝崎 祐二,東原 知哉,上田 充,陳 文章","銅/2-置換ピリジン類触媒によるo-cresol の酸化カップリング重合","高分子学会","高分子学会予稿集",,"Vol. 68","No. 1","p. 1Pc031",2019,May
"Motohiro AIBA,Yuji SHIBASAKI,Mitsuo ODA,Chihiro OOKA,Seijiro FUKUTA,Tomoya HIGASHIHARA,Shinji ANDO,Mitsuru UEDA,Wen-Chang CHEN","Synthesis of Poly(o-cresol) by Oxidative Coupling Polymerization of o-Cresol",,"J. Polym. Sci. Part B, Polym. Chem",,"Vol. 57","No. 8","pp. 878-884",2019,Feb.
"Jin-gang LIU,Yasuhiro NAKAMURA,Tomohito OGURA,Yuji SHIBASAKI,Shinji ANDO,mitsuru ueda","Optically Transparent Sulfur-Containing Polyimide-TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)-TiO2 Nanocomposite Film",,"Chemistry of Materials","American Chemical Society","Vol. 20","  Issue 1","pp. 273-281",2008,Dec.
"鈴木 康夫,劉 金剛,芝崎 祐二,中村 康広,安藤 慎治,上田 充","スルホン構造を含む高透明性・高屈折率含硫黄ポリイミドの合成",,"ポリイミド最近の進歩2008","ポリイミド研究会編, 繊維工業技術振興会","Vol. 2008",,"pp. 90-92",2008,July
"Yasuo SUZUKI,Jin-gang LIU,Yasuhiro NAKAMURA,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'-[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines",,"Polymer Journal","Springer Nature Publishing","Vol. 40","No. 5","pp. 414-420",2008,Mar.
"Claudio A. TERRAZA,Jin-Gang LIU,Yasuhiro NAKAMURA,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","Synthesis and Properties of Highly Refractive Polyimides Derived from Fluorene-Bridged Sulfur-Containing Dianhydrides and Diamines",,"Journal of Polymer Science Part A: Polymer Chemistry","Wiley","Vol. 46","  Issue 4","p. 1510-1520",2008,Jan.
"Jin-Gang Liu,Yasuhiro NAKAMURA,Claudio A. TERRAZA,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","Highly Refractive Polyimides Derived from 2,8-Bis(p-aminophenylenesulfanyl) dibenzothiophene and Aromatic Dianhydrides",,"Macromolecular Chemistry and Physics","Wiley","Vol. 209","  Issue 2","p. 195-203",2008,Jan.
"J. Nunoshige,H. Akahoshi,Y. Shibasaki,M. Ueda","Efficient Oxidative Coupling Polymerization for Synthesis of Thermosetting Poly(phenylene ether) Copolymer with a Low Dielectric Loss J. Polym. Sci. Part-A, Polym. Chem., 46,5278-5282 (2008)",,"J. Polym. Sci. Part-A, Polym. Chem.,",,"Vol. 46",,"pp. 5278-5282",2008,
"Jin-gang LIU,Yuji SHIBASAKI,Shinji ANDO,Mitsuru Ueda","Synthesis and Thermal Properties of Polythioetherimides Derived from 4,4'-[p-Thiobis(phenylenesulfanyl)] Diphthalic Anhydride and Various Aromatic Diamines",,"High Performance Polymers","SAGE Publications","Volume 20","  Issue 2","Page 221-237",2007,Nov.
"鈴木康夫,劉金剛,芝崎祐二,中村康広,安藤慎治,上田充","高透明性・高屈折率含硫黄ポリイミド[II]?スルホン構造を含むポリイミド","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 4928-9",2007,Sept.
"劉 金剛,中村康広,芝崎祐二,鈴木康夫,安藤慎治,上田充","高透明性、高屈折率含硫黄ポリイミド[I]?合成・ナノハイブリッド化・微細加工","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 4903-4",2007,Sept.
"安藤慎治,劉 金剛,中村康広,芝崎祐二,鈴木康夫,上田充","高透明性・高屈折率含硫黄ポリイミド [III]?DFT計算による物性予測と光学測定による解析","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 4905-6",2007,Sept.
"河野俊司,芝崎祐二,安藤慎治,上田充","100%の分岐度を有するポリ〔2-（4-フェノキシ）フェノキシフルオレノン〕の合成","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 499",2007,May
"劉 金剛,中村康広,芝崎祐二,安藤慎治,上田充","新規含硫黄高屈折率、低副屈折率ポリイミドの合成","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 1676",2007,May
"劉 金剛,中村康広,芝崎祐二,安藤慎治,上田充","含硫黄高屈折率ポリイミドの合成[1]:分子設計、合成、およびその物性","高分子学会","高分子学会予稿集",,"Vol. 56","No. 1","pp. 1411",2007,May
"Jin-gang LIU,Yasuhiro NAKAMURA,Yasuo SUZUKI,Yuji SHIBASAKI,Shinji ANDO,mitsuru ueda","Synthesis and Characterization of Highly Refractive Polyimides from 4,40-Thiobis[(p-phenylenesulfanyl)aniline] and Various Aromatic Tetracarboxylic Dianhydrides",,"J. Polym. Sci. Part A, Polym Chem.",,"Vol. 45","No. 23","pp. 5606-5617",2007,
"Shibasaki Yuji,Toyokawa Fumihiro,Ando Shinji,Ueda Mitsuru","Highly Transparent Photosensitive Polybenzoxazole: Poly(o-hydroxy amide) Derived From 4,4’-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides",,"Polymer Journal",,"Vol. 39","No. 1","pp. 1-9",2007,
"Shunji KONO,Warapon SINANANWANICH,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone",,"Polymer J.",,"Vol. 39","No. 11","pp. 1150?1156",2007,
"芝崎　祐二,野村淳子","耐熱性ポリフェニレンエーテルの製造法と応用",,"シーエムシー出版,機能材料",,"Vol. 27","No. 11","pp. 50-56",2007,
"Jin-gang LIU,Yasuhiro NAKAMURA,Yasuo SUZUKI,Yuji SHIBASAKI,Shinji ANDO,mitsuru ueda","Highly Refractive and Transparent Polyimides Derived from 4,4'-[m-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-Containing Aromatic Diamines",,"Macromolecules",,"Vol. 40","No. 22","pp. 7902-7909",2007,
"Jin-gang LIU,Yasuhiro NAKAMURA,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","High Refractive Index Polyimides Derived from 2,7-Bis(4-aminophenylenesulfanyl)thianthrene and Aromatic Dianhydrides",,"Macromolecules",,"Vol. 40","No. 13","pp. 4614-4620",2007,
"Jin-gang LIU,Yasuhiro NAKAMURA,Yuji SHIBASAKI,Shinji ANDO,Mitsuru UEDA","Synthesis and Characterization of High Refractive Index Polyimides Derived from 4,40-(p-Phenylenedisulfanyl)dianiline and Various Aromatic Tetracarboxylic Dianhydrides",,"Polym. Journal",,"Vol. 39","No. 6","pp. 543?550",2007,
"Yuji SHIBASAKI,Fumihiro TOYOKAWA,Shinji ANDO,Mitsuru UEDA","Highly Transparent Photosensitive Polybenzoxazole: Poly(o-hydroxy amide) Derived from 4,4′-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides",,"Polym. Journal",,"Vol. 39","No. 1","pp. 81-89",2007,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru","Synthesis of a novel high sensitive and thermal stable photo-radical initiator: N-[2-(2-acryloyloxyethoxy)ethyl]biphenyldicarboximide",,"Journal of Photopolymer Science and Technology",,"Vol. 19","No. 2","pp. 283-284",2006,
"芝崎　祐二,野村淳子","酸化カップリング重合による新規エンジニアリングプラスチックの開発",,"大成社,Polyfile",,"Vol. 43","No. 514","pp. 32-36",2006,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru","A positive-type alkaline-developable photosensitive polyimide based on the poly(amic acid) from 2,2',6,6'-biphenyltetracarboxylic dianhydride and 1,3-bis(4-aminophenoxy)benzene, and a diazonaphthoquinone",,"Polymer Journal",,"Vol. 38","No. 11","pp. 1189-1193",2006,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru","Synthesis and properties of a novel high sensitive photo-radical initiator based on biphenyl-2,2'-dicarboximide derivatives",,"Polymer Journal",,"Vol. 38","No. 10","pp. 1074-1080",2006,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru","Synthesis and properties of poly(amic acid)s and polyimides based on 2,2',6,6'-biphenyltetracarboxylic dianhydride",,"Journal of Polymer Science, Part A: Polymer Chemistry",,"Vol. 44","No. 21","pp. 6385-6393",2006,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru","Synthesis of a novel high sensitive and thermal stable photoradical initiator: N-[2-(2-acryloyloxyethoxy)ethyl]biphenyldicarboximide",,"Journal of Photopolymer Science and Technology",,"Vol. 19","No. 2","pp. 283-284",2006,
"Matsumoto Kazuya,Shibasaki Yuji,Ando Shinji,Ueda Mitsuru","Synthesis of novel poly[(1,3-adamantyl)bis(2-naphthol)] with low dielectric constant",,"Polymer",,"Vol. 47","No. 9","pp. 3043-3048",2006,
"Tsuchiya Kousuke,Shibasaki Yuji,Aoyagi Masahiro,Ueda Mitsuru","Synthesis of a Novel Poly(binaphthylene ether) Containing Trifluoromethyl Groups with a Low Dielectric Constant",,"Macromolecules",,"Vol. 39","No. 11","pp. 3964-3966",2006,
"Yamazaki Natsuko,Washio Isao,Shibasaki Yuji,Ueda Mitsuru","Facile Synthesis of Aryl Ether Dendrimer from Unprotected AB2 Building Blocks Using Thionyl Chloride as an Activating Agent",,"Organic Letters",,"Vol. 8","No. 11","pp. 2321-2324",2006,
"Fukukawa Ken-ichi,Shibasaki Yuji,Ueda Mitsuru","Direct patterning of poly(amic acid) and low-temperature imidization using a photo-base generator",,"Polymers for Advanced Technologies",,"Vol. 17","No. 2","pp. 131-136",2006,
"Watanabe Yasufumi,Shibasaki Yuji,Ando Shinji,Ueda Mitsuru","Synthesis and characterization of novel low-k polyimides from aromatic dianhydrides and aromatic diamine containing phenylene ether and perfluorobiphenyl units",,"Polymer Journal",,"Vol. 38","No. 1","pp. 79-84",2006,
"芝崎祐二","UV・EB硬化技術の最新動向",,,"シーエムシー出版",,,"pp. 91-95",2006,
"Yuji Shibasaki","Three-Component Negative-Type Photosensitive Polyimide Precursor Based on Poly(amic acid) a Cross-Linker and a Photoacid Generator.",," J. Polym. Sci. Part A; Polym. Chem.",,"Vol. 43",,,2005,
"Yuji Shibasaki","Synthesis of Photosensitive and Thermosetting Poly(phenylene ether) Based on Poly[2 6-di(3-methyl-2-butenyl)phenol-co-2 6-dimethyl- phenol] and a Photoacid Generator.",,"J. Polym. Sci. Part A; Polym. Chem.",,"Vol. 43","No. 1","pp. 149",2005,
"Fukuhara Toshiaki,Shibasaki Yuji,Ando Shinji,Kishimura Shinji,Endo Masayuki,Sasago Masaru,Ueda Mitsuru.","Synthesis of Poly[N-(1-adamantyl)vinylsulfonamide-co-2-(2-methyl)adamantylmethacrylate] for 193 nm Lithography.",,"Macromolecules",,"Vol. 38","No. 8","pp. 3041-3043",2005,
"Watanabe Yasufumi,Shibasaki Yuji,Ando Shinji,Ueda Mitsuru.","New negative-type photosensitive alkaline-developable semi-aromatic polyimides with low dielectric constants based on poly(amic acid) from aromatic diamine containing adamantyl units and alicyclic dianhydrides, a cross-linker, and a photoacid generator.",,"Polymer Journal",,"Vol. 37","No. 4","pp. 270-276",2005,
"Shibasaki Yuji,Nakamura Masahiro,Ishimaru Ryuhei,Kondo Junko N.,Ueda Mitsuru.","Oxidative coupling polymerization of 2,6-dimethylphenol with a copper-amine catalyst immobilized within the interior of SBA-15.",,"Chemistry Letters",,"Vol. 34","No. 5","pp. 662-663",2005,
"Toyokawa Fumihiro,Fukukawa Ken-Ichi,Shibasaki Yuji,Ando Shinji,Ueda Mitsuru.","Synthesis of a highly transparent poly(o-hydroxyamide) in the i-line region and its application to photosensitive polymers.",,"Journal of Polymer Science, Part A: Polymer Chemistry",,"Vol. 43","No. 12","pp. 2527-2535",2005,
"Watanabe Yasufumi,Shibasaki Yuji,Ando Shinji,Ueda Mitsuru.","Synthesis and characterization of polyimides with low dielectric constants from aromatic dianhydrides and aromatic diamine containing phenylene ether unit.",,"Polymer",,"Vol. 46","No. 16","pp. 5903-5908",2005,
"Yuji Shibasaki","Novel Strategies for Fundamental Innovation in Polymer Science",,,"Research Signpost",,,"pp. 19-38",2005,
"Toyokawa Fumihiro,Shibasaki Yuji,Ueda Mitsuru.","A novel low temperature curable photosensitive polybenzoxazole.",,,,"Vol. 37","No. 7","pp. 517-521",2005,
"Nomura Masayoshi,Shibasaki Yuji,Ueda Mitsuru,Tugita Kouhei,Ichikawa Musubu,Taniguchi Yoshio.","New amorphous electron-transporting materials based on Tris-benzimidazoles for all wet-process OLED devices.",,"Synthetic Metals",,"Vol. 151","No. 3","pp. 261-268",2005,
"Shibasaki Yuji,Araki Tomoko,Nagahata Ritsuko,Ueda Mitsuru.","Control of molecular weight distribution in polycondensation polymers 2. Poly(ether ketone) synthesis.",,"European Polymer Journal",,"Vol. 41","No. 10","pp. 2428-2433",2005,
"Sakayori Katsuya,Shibasaki Yuji,Ueda Mitsuru.","Synthesis of a novel high sensitive photo-radical initiator with good thermal stability based on naphthalic-1, 8-N-alkylimide derivatives.",,"Journal of Polymer Science, Part A: Polymer Chemistry",,"Vol. 43","No. 22","pp. 5571-5580",2005,
"Washio Isao,Shibasaki Yuji,Ueda Mitsuru.","Facile synthesis of polyamide dendrimers from unprotected AB2 building blocks: Dumbbell-shaped dendrimer, star-shaped dendrimer, and dendrimer with carboxylic acid at core.",,"Macromolecules",,"Vol. 38","No. 6","pp. 2237-2246",2005,
"芝崎祐二　上田充","新時代の多孔性材料とその応用　-ナノサイエンスが作る新材料-",,"シーエムシー出版","シーエムシー出版",,,,2004,
"Yuji Shibasaki","Synthesis of photosensitive and thermosetting poly(phenylene ether) containing butenyl groups. ",,"Journal of Photopolymer Science and Technology",,"Vol. 17","No. 2","pp. 281",2004,
"Yuji Shibasaki","A positive type alkaline developable thermally stable and photosensitive polymer based on partially O-methylated poly(2 6-dihydroxy-1 5-naphthylene) an acidolytic de-cross-linker and a photoacid generator.",,"Polymer",,"Vol. 45","No. 20","pp. 6873",2004,
"Yuji Shibasaki","Efficient catalyst for low temperature solid-phase imidization of poly(amic acid).",,"Chemistry Letters ",,"Vol. 33","No. 9","pp. 1156",2004,
"Yuji Shibasaki","A Photosensitive Semi-Alicyclic Poly(benzoxazole) with High Transparency and Low Dielectric Constant.",,"Macromolecules ",,"Vol. 37","No. 22","pp. 8556",2004,
"Yuji Shibasaki","An efficient catalyst for low temperature solid-phase cyclization of poly(o-hydroxyamide).",,"Chemistry Letters ",,"Vol. 33","No. 10","pp. 1342",2004,
"Yuji Shibasaki","Synthesis of a Novel Poly(binaphthylene ether) with a Low Dielectric Constant.",,"Macromolecules",,"Vol. 37","No. 13","pp. 4794",2004,
"Yuji Shibasaki","Photosensitive poly(benzoxazole) via poly(o-hydroxy azomethine) II.Environmentally benign process in ethyl lactate.",,"Polymer Journal (Tokyo Japan) ",,"Vol. 36","No. 6","pp. 489",2004,
"Yuji Shibasaki","New positive-type photosensitive polyimide having sulfo groups 2. Polyimides from 2 2'-oxy(or thio)bis(5-aminobenzenesulfonic acid) 4 4'-oxydianiline and 4 4'-hexafluoro propylidene -bis(phthalic anhydride).",,"Journal of Photopolymer Science and Technology",,"Vol. 17","No. 2","pp. 263",2004,
"Yuji Shibasaki","New Photoresist Based on Amorphous Low Molecular Weight Polyphenols",,"J. Photopolym. Sci & Technol.",,"Vol. 17",,"pp. 435",2004,
"Yuji Shibasaki","Three-Component Negative-Type Alkaline-Developable Thermally Stable and Photosesitive Polymer Based on Poly(2 6-dihydroxy-1 5-naphthalene) a Crosslinker and a Photoacid Generator",,"J. Polym. Sci. Part-A Polym. Chem.",,"Vol. 42",,"pp. 2235",2004,
"Yuji Shibasaki","Synthesis and Properties of Poly(di(1-naphthyl)-4-tolylamine) as a Hole Transport Material",,"Macromolecules",,"Vol. 37",,"pp. 1204",2004,
"Yuji Shibasaki","Synthesis of Thermosetting Poly(phenylene ether) containing Allyl Groups",,"Polymer",,"Vol. 45",,"pp. 843",2004,
"Yuji Shibasaki","Synthesis of Semiaromatic Polyimides from Aromatic Diamines Containing Adamantyl Units and Alicyclic Dianhydrides",,"J. Polym. Sci. Part-A  Polym. Chem.",,"Vol. 42",,"pp. 144",2004,
"芝崎　祐二,上田　充","重縮合系高分子の分子量・分子量分布の精密制御",,"シーエムシー出版,精密高分子技術",,,,"pp. 411-421",2004,
"Shibasaki Yuji,Nakamura Masahiro,Ishimaru Ryuhei,Kondo Junko N.,Domen Kazunari,Ueda Mitsuru.","Regio-controlled oxidative coupling polycondensation of 2 5-dimethylphenol induced by mesoporous interior.",,"Macromolecules",,"Vol. 37","No. 26","pp. 9657-9659",2004,
"芝崎　祐二,上田　充","光応用技術・材料事典",,,"産業技術サービスセンター",,,,2004,
"Yuji Shibasaki","A New Photoresist Materials for 157 nm Lithography-3: Poly[2-hydroxy-3-pianyl vinyl sulfonate-co-4-(1 1 1 3 3 3-hexafluoro-2-Hydroxypropyl)styrene",,"J. Photopolym. Sci & Technol.",,"Vol. 16",,"pp. 601",2003,
"芝崎祐二　上田充","重縮合系高分子の分子量、分子量分布の精密制御",,"機能材料",,"Vol. 23","No. 11","pp. 22",2003,
"Yuji Shibasaki","A New Negative-Type Photosensitive Polymer Based on Poly(2 6-dihydro-1 5-naphthalene) a Cross-Linker and a Photoacid Generator",,"J. Photopolym. Sci & Technol.",,"Vol. 16",,"pp. 285",2003,
"Yuji Shibasaki","Chemically Amplified Photosensitive Poly(benzoxazole)",,"J. Photopolym. Sci & Technol.",,"Vol. 16",,"pp. 287",2003,
"Yuji Shibasaki","New Convenient Synthetic Route for Photosensitive Poly(benzoxazole)",,"J. Photopolym. Sci & Technol.",,"Vol. 16",,"pp. 237",2003,
"Yuji Shibasaki","Rapid Synthesis of Polyamide Dendrimers from Unprotected AB2 Building Blocks.",,"J. Am. Chem. Soc.",,"Vol. 125",,"pp. 8120",2003,
"Yuji Shibasaki","New Photoresist Materials for 157 nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4(1 1 1 3 3 3-hexafluoro-2-hydroxypropyl)styrene Partially Protected with tert-Butoxycarbonyl",,"Chem.Mater.",,"Vol. 15",,"pp. 1512",2003,
"Yuji Shibasaki","Tandem Type Polymerization. Synthesis and Characterization of Ordered Poly(amide-thioether) from 2 6-Dichlorophenyl Methacrylate 4 4’-Thiobis(benzenethiol) and 4 4’-Oxydianiline",,"Macromolecules",,"Vol. 36",,"pp. 1815",2003,
"Yuji Shibasaki","Convenient Synthesis of Poly(2 6-dihydroxy-1 5-naphthylene) by Cu(II)-amin Catalyzed Oxidative Coupling Polymerization",,"Polymer",,"Vol. 44",,"pp. 355",2003,
"Yuji Shibasaki","Photosensitive poly(benzoxazole) based on Precursor from Diphenyl Isophthalate and Bis(o-aminophenol)",,"Polymer",,"Vol. 44",,"pp. 333",2003,
"Yuji Shibasaki","A new negative-type photosensitive polymer based on poly(2,6-dihydroxy-1,5-naphthalene), a cross-linker, and a photoacid generator. ",,"Journal of Photopolymer Science and Technology",,"Vol. 16","No. 2","pp. 285",2003,
"Yuji Shibasaki","New convenient synthetic route for photosensitive poly(benzoxazole). ",,"Journal of Photopolymer Science and Technology",,"Vol. 26","No. 2","pp. 285",2003,
"Yuji Shibasaki","Synthesis of polyamide dendrimers from unprotected AB2-building block using thionyl chloride as a condensing agent",,"Polymer Preprints (American Chemical Society, Division of Polymer Chemistry)",,"Vol. 44","No. 2","pp. 837",2003,
"Yuji Shibasaki","Synthesis of naphthalene polymer with low dielectric constant. ",,"Polymer Preprints (American Chemical Society, Division of Polymer Chemistry)",,"Vol. 44","No. 2","pp. 835",2003,
"Yuji Shibasaki","Rapid synthesis of polyamide dendrimers from unprotected AB2 building blocks.",,"JOURNAL OF THE AMERICAN CHEMICAL SOCIETY",,"Vol. 125","No. 27","pp. 8120",2003,
"Yuji Shibasaki","Tandem Type Polymerization. Synthesis and Characterization of Ordered Poly(amide-thioether) from 2,6-Dichlorophenyl Methacrylate, 4,4'-Thiobis(benznenethiol), and 4,4'-Oxydianiline.",,"Macromolecules",,"Vol. 36","No. 6","pp. 1815",2003,
"Yuji Shibasaki","Chemically amplified photosensitive poly(benzoxazole)",,"Journal of Photopolymer Science and Technology",,"Vol. 16","No. 2","pp. 287",2003,
"Washio Isao,Shibasaki Yuji,Ueda Mitsuru","Facile Synthesis of Polyamide Dendrimers from Unprotected AB2 Building Blocks",,"Organic Letters",,,,,2003,
"芝崎　祐二,上田　充","重縮合系高分子の分子量・分子量分布の精密制御",,"シーエムシー出版,機能材料",,"Vol. 23","No. 11","pp. 22-29",2003,
"Morita Kosuke,Ebara Kazuya,Shibasaki Yuji,Ueda Mitsuru,Goto Kenichi,Tamai Souji","New positive-type photosensitive polyimide having sulfo groups",,"Polymer",,"Vol. 44","No. 20","pp. 6235",2003,
"Shibasaki Yuji,Kondo Junko N.,Domen Kazunari,Ueda Mitsuru","Immobilization of monometallic copper complexes on mesoporous silica and their activity as catalyst for oxidative coupling polymerization of phenols.",,"Polymer Preprints (American Chemical Society, Division of Polymer Chemistry)",,"Vol. 44","No. 2","pp. 709",2003,
"Fumio Sanda,Hidetsugu Sanada,Yuji Shibasaki,Takeshi Endo","Star polymer synthesis from e-caprolactone utilizing polyol / protonic acid initiator",,"Macromolecules",,"Vol. 35",,"pp. 680",2002,
"Yuji Shibasaki","A new photoresist material for 157 nm lithography-2",,"Journal of Photopolymer Science and Technology",,"Vol. 15","No. 4","pp. 643",2002,
"Yuji Shibasaki","Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines and Alicyclic Dianhydrides",,"Macromolecules",,"Vol. 35","No. 6","pp. 2277",2002,
"Yuji Shibasaki","Convenient synthesis of poly(2,6-dihydroxy-1,5-naphthylene) by Cu(II)-amine catalyzed oxidative coupling polymerization",,"Polymer",,"Vol. 44","No. 2","pp. 333",2002,
"Yuji Shibasaki","Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)",,"Polymer",,"Vol. 44","No. 2","pp. 333",2002,
"Yuji Shibasaki","New synthetic route for photosensitive poly(benzoxazole). ",,"Journal of Polymer Science, Part A: Polymer Chemistry",,"Vol. 40","No. 20","pp. 3399",2002,
"Yuji Shibasaki","New photoresist material for 157 nm lithography",,"Polymeric Materials Science and Engineering",,"Vol. 86",,"pp. 148",2002,
"Yuji Shibasaki","A new positive-type photosensitive alkaline-developable alicyclic polyimide based on polyamic acid silyl ester as a polyimide precursor and diazonaphthoquinone as a photosensitive compound",,"Chemistry of Materials",,"Vol. 14","No. 4","pp. 1762",2002,
"Yuji Shibasaki","New positive-type photosensitive polymer based on poly(2,6-dihydroxy-1,5-naphthylene) and diazonaphthoquinone",,"Journal of Polymer Science, Part A: Polymer Chemistry",,"Vol. 40","No. 3","pp. 393",2002,
"Shibasaki Yuji,Araki Tomoko,Okazaki Masaki,Ueda Mitsuru","Control of molecular weight distribution in polycondensation polymers. Polyamide synthesis",,"Polymer Journal",,"Vol. 34","No. 4","pp. 261",2002,
"Shibasaki Yuji,Ueda Mitsuru","Synthesis of poly(aryl ether) by Pd-catalyzed polycondensation",,"Chemistry Letters",,"Vol. 8",,"pp. 794",2002,
"Shibasaki Yuji,Sasada Yasuyuki,Ueda Mitsuru","New positive-type chemically amplified photosensitive poly(phenylene ether): 5 synthesis of poly(2-hydroxy-6-methylphenylene ether) by oxidative coupling polymerization of 2-trialkylsilyloxy-6-methylphenol.",,"Journal of Photopolymer Science and Technology",,"Vol. 15","No. 2","pp. 197",2002,
"Imai Yoshio,Shibasaki Yuji,Takeuchi Hisashi,Park Ki Hong,Kakimoto Masa-Aki","Synthesis and properties of soluble aromatic poly(ether benzoxazole)s from 9, 9-bis[4-(4-amino-3-hydroxyphenoxy)phenyl]fluorene and aromatic dicarboxylic acid chlorides",,"High Performance Polymers",,"Vol. 14","No. 3","pp. 253",2002,
"Shibasaki Yuji,Ueda Mitsuru","Poly(arylene ether) by Pd-catalyzed polycondensation",,"Polymer Preprints (American Chemical Society, Division of Polymer Chemistry)",,"Vol. 43","No. 2","pp. 920",2002,
"Takeshi Endo,Yuji Shibasaki,Fumio Sanda","Controlling ring-opening polymerization of cyclic carbonates and lactones by an activated monomer mechanism",,"J. Polym. Sci. Part A: Polymer Chemistry",,"Vol. 40","No. 13","pp. 2190",2002,
"Yuji Shibasaki,Tomoko Araki,Mitsuru Ueda","Control of Molecular Weight Distribution in Polycondensation Polymers: Polyamide Synthesis",,"Asia Polymer Symposium",,,,"pp. 92",2001,
"Yuji Shibasaki","Convenient synthesis of aliphatic polyester catalyzed by distannoxane",,"Biomacromolecules",,"Vol. 2","No. 4","pp. 1267",2001,
"Yuji Shibasaki","A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator",,"Journal of Photopolymer Science and Technology",,"Vol. 14","No. 2","pp. 275",2001,
"Yuji Shibasaki","New Positive Type Chemically Amplified Photosensitive Poly(phenylene ether): 4. Partially tert-Butoxycarbonylated Poly(2-hydroxy-6-methylphenol-co-2,6-dimethylphenol) with a Photoacid Generator",," J. Photopolym. Sci. & Tech.",,"Vol. 14","No. 1","pp. 51",2001,
"Yuji Shibasaki,Tomoko Araki,Mitsuru Ueda","Synthesis of Aromatic Polyamide with Narrow Polydispersity via Polycondensation",,"Polym. Prepr., Am. Chem. Soc. Div. Polym. Chem.",,"Vol. 42","No. 2","pp. 401",2001,
"Yuji Shibasaki","Direct Synthesis of Photosensitive Poly(benzoxazole)",,"J. Photopolym. Sci. & Tech.",,"Vol. 14","No. 1","pp. 55",2001,
"Yuji Shibasaki","New Positive Type Photosensitive Polyimide : Hyperbranched Poly(ether imide) with Diazonaphtoquinone",," J. Photopolym. Sci. & Tech.",,"Vol. 14","No. 1","pp. 45",2001,
"Yuji Shibasaki","New Negative-Type Photosensitive Polyimide Based on Hyperbranched Poly(ether imide), a Cross-Linker, and a Photoacid Generator",,"Chem. Lett.",,,,"pp. 762",2001,
"Yuji Shibasaki","Acid Promoted Ring-Opening Polymerization Behavior of Cyclic Carbonates and Lactones",,,,,,,2000,Feb.
"Yuji Shibasaki,Fumio Sanda,Takeshi Endo","A novel acid promoted ring-opening polymerization of a seven-membered cyclic carbonate initiated with BCl3",,"Macromol. Chem. Rapid Commun.",,"Vol. 21",,"pp. 489",2000,
"Yuji Shibasaki","Acid promoted living ring-opening polymerization of cyclic carbonates with B(OR)3",,"Macromolecules",,"Vol. 33",,"pp. 3630",2000,
"Yuji Shibasaki,Fumio Sanda,Takeshi Endo","Cationic precise polymerization of seven-membered cyclic carbonate with water-hydrogen chloride through activated monomer process",,"Macromolecules",,"Vol. 33",,"pp. 3590",2000,
"Yuji Shibasaki,Hidetsugu Sanada,Makiko Yokoi,Fumio Sanda,Takeshi Endo","Activated monomer cationic polymerization of lactones and the application of block copolymer synthesis with a seven-membered cyclic carbonate",,"Macromolecules",,"Vol. 33",,"pp. 4316",2000,
"Yuji Shibasaki,Fumio Sanda,Takeshi Endo","Activated monomer cationic polymerization of 1,3-dioxepan-2-one initiated by water-hydrogen chloride",,"Macromol. Rapid Commun.",,"Vol. 20",,"pp. 532",1999,
"Yuji Shibasaki,Ryoji Nomura,Takeshi Endo","Reduction of the cationic growing center of polyisobutylene by activated magnesium. Block copolymerization of isobutylene with tert-butyl methacrylate ",,"Macromol. Chem. Phys.",,"Vol. 199",,"pp. 2618",1998,
"Yuji Shibasaki","Transformation of the cationic growing center of poly(tetrahydrofuran) into an anionic one by bis(pentamethylcyclopentadienyl)samarium",,"J. Polym. Sci., Part A: Polym. Chem.",,"Vol. 36",,"pp. 2209",1998,
"芝崎祐二","サマリウム二価錯体による新規生長末端変換反応と、これを利用する共重合体の合成
",,,,,,,1997,
"Yuji Shibasaki","Block copolymerization of tetrahydrofuran with d-valerolactone by the samarium iodide-induced transformation ",,"Polym.Bull.",,"Vol. 37",,"pp. 597",1996,
"芝崎祐二","新しい可溶性、耐熱性ポリペンゾオキサゾールの合成
",,,,,,,1995,