"Shiro Hino,Makoto Nakayama,Kenji Takahashi,Hiroshi Funakubo,Eisuke Tokumitsu","Characterization of Hafnium Oxide Thin Films by Sorce Gas Pulse Introduced Metalorganic Chemical Vapor Deposition using Amino-Family Hf Precursors",,"Jpn. J. Appl. Phys.",,"Vol. 42, Part 1","No. 9B","pp. 6015-6018",2003,Sept.
"Kenji Takahashi,Makoto Nakayama,Shiro Hino,Eisuke Tokumitsu,Hiroshi Funakubo","Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties",,"Integrated Ferroelectrics",,"vol. 57",,"pp. 1185-1192",2003,Mar.
"Kenji Takahashi,Makoto Nakayama,Shintaro Yokoyama,Takeshi Kimura,Eisuke Tokumitsu","Preparation of hafnium oxide films from oxygen-free Hf[N(C2H5)2]4 precursor and their properties",,"Applied Surface Science",,,"No. 216","pp. 296-301",2003,Jan.