"E.Tokumitsu,Y.Takano,H.Shibata,H.Saiki","Fabrication and Characterization of M-I-FIS ferroelectric-gate structures using HfAlOx buffer layer",,"Journal of Microelectronic Engineering",,"Vol. 84",,"pp. 2018-2021",2007,June
"�‚–ì —Fˆê,�Ö–Ø”Ž˜a,ŽÄ“c�G,“¿Œõ‰i•ã","‹à‘®�^�â‰�‘Ì�^‹­—U“d‘Ì�^�â‰�‘Ì�^”¼“±‘Ì�\‘¢�iM-I-FIS�\‘¢�jƒLƒƒƒpƒVƒ^‚Ì�ì�»‚Æ•]‰¿","‘æ54‰ñ‰ž—p•¨—�ŠwŠÖŒW˜A�‡�u‰‰‰ï",,,,"No. 29a-SV-4",,2007,Mar.