"E.Tokumitsu,Takeaki Isobe,Takeshi Kijima,Hiroshi Ishiwara","Fabrication and Characterization of Metal- Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) Structures Using Ferroelectric (Bi,La)<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub> Films",,"Jpn. J. Appl. Phys",,"Vol. 40","No. 9B","pp. 5576-5579",2001,Sept.