"Tomoyuki Kurihara,Yohei Nagahama,Daisuke Kobayshi,Hiroki Niikura,Yoshishige Tsuchiya,Hiroshi Mizuta,Hiroshi Nohira,Ken Uchida,Shunri Oda","Engineering of Heterostructured Tunnel Barrier for Non-Volatile Memory Applications: Potential of Pr-based Heterostructured Barrier as a Tunneling Oxide","IEEE Silicon Nanoelectronics Workshop",,,,,,2009,June