"Koji Hara,Yuichiro Tanushi,Shin-Ichiro Kuroki,Koji Kotani,Takashi Ito","Ion-Implanted Boron Activation in a Preamorphized Si Layer by Microwave Annealing","2009 International Conference on Solid  State Devices and Materials (SSDM2009)","Extended Abstracts of the 2009 International Conference on Solid  State Devices and Materials (SSDM2009)","2009 International Conference on Solid  State Devices and Materials (SSDM2009)",,,"pp. 330-331",2009,Oct.