"‘å–Ñ—˜Œ’Ž¡,W. Feng,R. Hettiarachchi,Yeonghun Lee,Soshi Sato,Kuniyuki KAKUSHIMA,M. Sato,K. Fukuda,M. Niwa,K. Yamabe,Kenji Shiraishi,HIROSHI IWAI,Keisaku Yamada","Low-frequency noise reduction in Si Nanowire MOSFETs","ECS 221st Meeting","ECS Transactions",,"Vol. 45","No. 3","pp. 437-442",2012,
"‘å–Ñ—˜Œ’Ž¡,W. Feng,R. Hettiarachchi,Yeonghun Lee,Soshi Sato,Kuniyuki KAKUSHIMA,M. Sato,K. Fukuda,M. Niwa,K. Yamabe,Kenji Shiraishi,HIROSHI IWAI,Keisaku Yamada","Low-frequency noise reduction in Si Nanowire MOSFETs","ECS 221st Meeting","ECS Transactions",,"Vol. 45","No. 3","pp. 437-442",2012,
"‘å–Ñ—˜Œ’Ž¡,W. Feng,R. Hettiarachchi,Yeonghun Lee,Soshi Sato,Kuniyuki KAKUSHIMA,M. Sato,K. Fukuda,M. Niwa,K. Yamabe,Kenji Shiraishi,HIROSHI IWAI,Keisaku Yamada","Low-frequency noise reduction in Si Nanowire MOSFETs","ECS 221st Meeting","ECS Transactions",,"Vol. 45","No. 3","pp. 437-442",2012,