"Shuhei Hosoda,K. Tuokedaerhan,Kuniyuki KAKUSHIMA,パールハットアヘメト,KAZUO TSUTSUI,片岡好則,Akira Nishiyama,Nobuyuki Sugii,Kenji Natori,takeo hattori,HIROSHI IWAI","Improvenents in interface, states with W-carbide metal gate for La2O3/si MOS Capacitor","Workshop and IEEE EDS Mini-colloquium on Nanometer CMOS Technology (WIMNACT 37)",,,,,,2013,