"Akihiro Matsutani,Kunio Nishioka,Mina Sato,Dai Shoji,Daito Kobayashi,Toshihiro Isobe,Akira Nakajima,Tetsu Tatsuma,Sachiko Matsushita","Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching",,"Japanese Journal of Applied Physics",,"Vol. 53",,"p. 06JF02",2014,May
"小林大斗,松谷晃宏,西岡國生,庄司 大,佐藤 美那,磯部敏宏,中島章,立間 徹,松下祥子","傾斜ドライエッチングを用いた酸化チタンフォトニック結晶の作製と評価","第61回 応用物理学会春季学術講演会",,,,,,2014,Mar.