"Akihiro Matsutani,Fumitaka Ishiwari,Yoshiaki Shoji,Takashi Kajitani,Takuya Uehara,Masaru Nakagawa,Takanori Fukushima","Chlorine -based inductively coupled plasma etching of GaAs wafer using tripodal paraffinic triptycene as an etching resist mask",,"Japanese Journal of Applied Physics",,"vol. 55",,"  06GL01",2016,May
"Ό’JWG,ΞŠ„•Ά’,―Žq—ǍW,γŒ΄ ‘μ–η,’†μ Ÿ,•Ÿ“‡F“T","Cl2-—U“±Œ‹‡Œ^ƒvƒ‰ƒYƒ}ƒGƒbƒ`ƒ“ƒO‚Ι‚¨‚―‚郄ƒkƒXŒ^ƒgƒŠƒvƒ`ƒZƒ“TripC12‚ΜƒGƒbƒ`ƒ“ƒO“Α«‚Μ•]‰Ώ","2014”N‘ζ75‰ρ‰ž—p•¨—Šw‰οH‹GŠwpu‰‰‰ο",,,,,,2014,Sept.