"Y. Miyajima,Yann Tison,C. E.  Giusca,Vlad Stolojan,H. Watanabe,Hitoe Habuchi,S. J.  Henley,Jhon M. Shannon,S Ravi P Silva","Probing the band structure of hydrogen-free amorphous carbon and the effect of nitrogen incorporation",,"Carbon",,"Vol. 49",,"pp. 5229-5238",2011,July
"Y. Miyajima,S. J.  Henley,S Ravi P Silva","Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition",,"Thin Solid Films",,"Vol. 519",,"pp. 6374-6380",2011,Apr.
"Y. Miyajima,M. Shkunov,S Ravi P Silva","Amorphous carbon and carbon nitride bottom gate thin film transistors",,"Appl Phys Lett",,"Vol. 95",,,2009,Sept.
"Y. Miyajima,S. J.  Henley,G. Adamopoulos,Vlad Stolojan,E. Garcia-Caurel,B. Drevillon,Jhon M. Shannon,S Ravi P Silva","Pulsed laser deposited tetrahedral amorphous carbon with high sp(3) fractions and low optical bandgaps",,"J Appl Phys",,"Vol. 105",,,2009,Apr.
"Y. Miyajima,G. Adamopoulos,S. J.  Henley,Vlad Stolojan,Yann Tison,E. Garcia-Caurel,B. Drevillon,Jhon M. Shannon,S Ravi P Silva","Electronic state modification in laser deposited amorphous carbon films by the inclusion of nitrogen",,"J Appl Phys",,"Vol. 104",,,2008,Sept.
"Y. Miyajima,A. A. D. T.  Adikaari,S. J.  Henley,J. M. Shannon,S. R. P. Silva","Electrical properties of pulsed UV laser irradiated amorphous carbon",,"Appl Phys Lett",,"Vol. 92",,,2008,Apr.
"Y. Miyajima,Jhon M. Shannon,S. J.  Henley,Vlad Stolojan,D. C.  Cox,S Ravi P Silva","Electrical conduction mechanism in laser deposited amorphous carbon",,"Thin Solid Films","Elsevier","Volume 516",,"Page 257-261",2007,May
"Paul C P  Watts,Natacha Mureau,Zhenni Tang,Yoji Miyajima,J David Carey,S Ravi P Silva","The importance of oxygen-containing defects on carbon nanotubes for the detection of polar and non-polar vapours through hydrogen bond formation",,"Nanotechnology","IOP Science","Volume 18","Number 17",,2007,Apr.
"Y. Miyajima,Shoji Nitta,S Ravi P Silva,D. A. Zeze","Surface induced bulk modifications of amorphous carbon nitride films by post-deposition oxygen and hydrogen plasma treatment",,"Thin Solid Films","Elsevier","Volume 491",,"Page 161-167",2005,July