"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Weakly guiding approximation of a three dimensional waveguide model for extreme ultraviolet lithography simulation",,"Journal of the Optical Society of America A","Optica Publishing Group","Vol. 41","Issue 8","pp. 1491-1499",2024,July
"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Pre-training CNN for fast EUV lithography simulation including M3D effects",,"Proc. SPIE 12954, DTCO and Computational Patterning III, 129540I","Society of Photo-Optical Instrumentation Engineers (SPIE)",,,,2024,Apr.
"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula",,"Journal of Micro/Nanopatterning, Materials, and Metrology",,"Vol. 23","Issue 1","  014201",2024,Jan.
"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula",,"Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500D","Society of Photo-Optical Instrumentation Engineers (SPIE)",,,,2023,Nov.
"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns",,"Journal of Micro/Nanopatterning, Materials and Metrology (JM3)","Society of Photo-optical Instrumentation Engineers","Vol. 22","Issue 2","  024201",2023,June
"Hiroyoshi Tanabe,Akira Jinguji,Atsushi Takahashi","Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns",,"Proc. SPIE 12495, Advanced Lithography + Patterning 2023, 124951J",,,,,2023,Apr.
"Hiroyoshi Tanabe,Atsushi Takahashi","Data augmentation in extreme ultraviolet lithography simulation using convolutional neural network",,"Journal of Micro/Nanopatterning, Materials and Metrology (JM3)",,"Vol. 21","Issue 4","  041602",2022,Oct.
"Hiroyoshi Tanabe,Atsushi Takahashi","Data augmentation in EUV lithography simulation based on convolutional neural network","Proc. SPIE 12052, Advanced Lithography + Patterning 2022, 120520T",,,,,,2022,May
"Hiroyoshi Tanabe","Classification of EUV masks based on the ratio of the complex refractive index k/(1-n)","International Conference on Extreme Ultraviolet Lithography 2021","Proceedings of SPIE",,"Vol. 11854",,"  1185416",2021,Oct.
"Hiroyoshi Tanabe,Shimpei Sato,Atsushi Takahashi","Fast EUV lithography simulation using convolutional neural network",,"Journal of Micro/Nanopatterning, Materials and Metrology (JM3)",,"Vol. 20","No. 4","pp. 1-14",2021,Sept.
"Tahsin Shameem,Shimpei Sato,Atsushi Takahashi,Hiroyoshi Tanabe,Yukihide Kohira,Chikaaki Kodama","A Fast LUT Based Point Intensity Computation for OPC Algorithm",,"Proc. the 23rd Workshop on Synthesis And System Integration of Mixed Information technologies (SASIMI 2021)",,,,"pp. 92-97",2021,Mar.
"Hiroyoshi Tanabe,Shimpei Sato,Atsushi Takahashi","Fast 3D lithography simulation by convolutional neural network",,"Proc. SPIE 11614, Design-Process-Technology Co-optimization XV 2021, 116140M",,,,"pp. 1-8",2021,Feb.
"Tahsin Binte Shameem,Atsushi Takahashi,Hiroyoshi Tanabe,Yukihide Kohira,Chikaaki Kodama","A Fast Look Up Table Based Lithography Simulator with SOCS Model for OPC Algorithm",,"Proc. DA Symposium 2020, IPSJ Symposium Series",,,,"pp. 142-149",2020,Sept.
"Hiroyoshi Tanabe","Fast 3D lithography simulation by convolutional neural network: POC study",,"Proc. SPIE 11518, Photomask Technology 2020, 115180L",,,,"pp. 1-7",2020,Sept.
"Hiroyoshi Tanabe,Shimpei Sato,Atsushi Takahashi","Fast 3D lithography simulation by convolutional neural network: POC study",,"Proc. SPIE 11518, Photomask Technology 2020, 115180L",,,,,2020,Sept.