"Katsuhisa Mizoguchi,tomoya higashihara,mitsuru ueda","Negative-Working Photosensitive Poly(phenylene ether) Based on Poly(2,6-dimethyl-1,4-phenylene ether), a Cross-Linker, and a Photoacid Generator",,"Macromolecules",,"Vol. 43","No. 6","pp. 2832-2839",2010,Aug.
"Y. Saito,K. Mizoguchi,T.  Higashihara,M. Ueda","Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator",,"J. Appl. Polym. Sci.",,"Vol. 113",,"pp. 3605-3611",2009,July
"Katsuhisa Mizoguchi,tomoya higashihara,mitsuru ueda","An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator",,"Macromolecules",,"Vol. 42","No. 4","pp. 1024-1030",2009,July
"Katsuhisa Mizoguchi,Tomoya Higashihara,Mitsuru Ueda","Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator",,"Macromolecules",,"Vol. 42","No. 4","pp. 1024-1030",2009,Feb.
"Katsuhisa Mizoguchi,Tomoya Higashihara,Mitsuru Ueda","An Alkaline-Developable, Negative-Working Photosensitive Polybenzoxazole Based 	on Poly(o-hydroxyamide), a Vinyl Sulfone-Type Cross-Linker, and a Novel Photobase Generator",,"Macromolecules",,"Vol. 42","No. 4","pp. 3780-3787",2009,Feb.
"Yu Shoji,Katsuhisa Mizoguchi,Mitsuru Ueda","Synthesis of aramides by polycondensation of aromatic dicarboxylic acids with aromatic diamines containing ether linkages","236th ACS National Meeting",,,,,,2008,Aug.
"Katsuhisa Mizoguchi,Mitsuru Ueda","A negative-type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), an ester-type cross-linker, and a photobase generator","236th ACS National Meeting",,,,,,2008,Aug.
"Yuta Saito,Katsuhisa Mizoguchi,Tomoya Higashihara,Mitsuru Ueda","Negative-type Chemically Amplified Photosensitive Novolac","Macro 2008",,,,,,2008,June
"齋藤 悠太,溝口 勝久,上田 充","高感度なネガ型ノボラック樹脂系レジストの開発","第57回高分子年次大会",,,,,,2008,May
"溝口 勝久,上田 充","新規画像形成機構によるネガ型感光性ポリベンゾオキサゾールの開発","第57回高分子年次大会",,,,,,2008,May
"荘司 優,溝口 勝久,上田 充","芳香族ジカルボン酸と芳香族ジアミンの重縮合によるアラミドの合成","第57回高分子年次大会",,,,,,2008,May
"katsuhisa mizoguchi,mitsuru ueda","Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator",,"J. Polym. Sci. Part-A, Polym. Chem",,"Vol. 46",,"  4949-4958",2008,
"Yu Shoji,Katsuhisa Mizoguchi,Mitsuru Ueda","Synthesis of Aramids by Polycondensation of Aromatic Dicarboxylic Acids with Aromatic Diamines Containing Ether Linkages",,"Polym. J.",,"Vol. 40",,"pp. 680-681",2008,
"Katsuhisa Mizoguchi,Mitsuru Ueda","Direct Patterning of Poly(ether ether sulfone) Using a Cross-linker and a Photoacid Generator",,"Polym. J",,"Vol. 40",,"pp. 645-650",2008,
"tomohito ogura,katsuhisa mizoguchi,mitsuru ueda","Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator",,"J. Photopolym. Sci.＆Technol.",,"Vol. 21",,"pp. 125-130",2008,
"yuta saito,katsuhisa mizoguchi,mitsuru ueda","Negative-type Chemically Amplified Photosensitive Novolac",,"J. Photopolym. Sci.＆Technol",,"Vol. 21",,"pp. 161-164",2008,