"Yuta Saito,Tomoya Higashihara,Mitsuru Ueda","Direct Patterning of Regioregular Poly(3-hexylthiophene)","European Polymer Congress 2011",,,,,,2012,Aug.
"βV“‘ —I‘Ύ,Žπˆδ —ǐ³,“ŒŒ΄ ’mΖ,γ“c [","Š΄Œυ«‚π—L‚·‚鍂—U“d—¦ƒQ[ƒgβ‰ή—Ώ","‘ζ60‰ρ‚•ͺŽq”NŽŸ‘ε‰ο","Polym. Prepr. Jpn.",,"Vol. 60","No. 1","p. 1511",2011,May
"Y. Saito,T. Higashihara,M. Ueda","Direct Photo-Patterning of Poly(3-Hexylthiophene).",,"J Photopolym Sci Tech",,"Vol. 24","No. 3","p. 273-276",2011,
"Y. Saito,K. Mizoguchi,T.  Higashihara,M. Ueda","Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator",,"J. Appl. Polym. Sci.",,"Vol. 113",,"pp. 3605-3611",2009,July
"yuta saito,tomoya higashihara,mitsuru ueda","Highly refractive and photosensitive polyimide",,,,"Vol. 22",,"pp. 423-428",2009,July
"Yuta Saito,Kazuya Matsumoto,T. Higashihara,mitsuru ueda","A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator",,"Chem. Lett",,"Vol. 38",,"pp. 1048-1049",2009,July
"Yuta Saito,Katsuhisa Mizoguchi,Tomoya Higashihara,Mitsuru Ueda","Negative-type Chemically Amplified Photosensitive Novolac","Macro 2008",,,,,,2008,June
"βV“‘ —I‘Ύ,aŒϋ Ÿ‹v,γ“c [","‚Š΄“x‚ΘƒlƒKŒ^ƒmƒ{ƒ‰ƒbƒNŽχŽ‰ŒnƒŒƒWƒXƒg‚ΜŠJ”­","‘ζ57‰ρ‚•ͺŽq”NŽŸ‘ε‰ο",,,,,,2008,May
"yuta saito,katsuhisa mizoguchi,mitsuru ueda","Negative-type Chemically Amplified Photosensitive Novolac",,"J. Photopolym. Sci.•Technol",,"Vol. 21",,"pp. 161-164",2008,