"田中敦,宇津木貴太,西山昭雄,脇谷尚樹,塩田忠,櫻井修,篠崎和夫","Al(CH3)3を原料とするMOCVD法によるα−Al2O3薄膜の製膜条件の最適化","日本セラミックス協会2014年年会","日本セラミックス協会2014年年会講演予稿集",,,,"  2G28",2015,Mar.
"林俊甫,田中 敦,西山 昭雄,塩田 忠,櫻井修,篠崎 和夫","Fabrication of a-Al2O3 thin films at lower temperature by low pressure MOCVD","第4回日本セラミックス協会関東支部若手研究発表交流会","第4回日本セラミックス協会関東支部若手研究発表交流会講演要旨集",,,,"  43",2014,Oct.
"宇津木貴太,田中敦,西山昭雄,塩田忠,櫻井修,篠崎和夫,脇谷尚樹","PLD 法を用いたCr2O3シード層の製膜と MOCVD 法によるAl2O3薄膜の結晶化への影響","日本セラミックス協会第30回関東支部研究発表会","日本セラミックス協会第30回関東支部研究発表会講演予稿集",,,,"  B13",2014,Sept.
"Lin,A. Tanaka,N. Ishizaki,A. Nishiyama,N. Wakiya,J. S. Cross,T. Shiota,O. Sakurai,K. Shinozaki","Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3","The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)","Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)",,,,"  26pKP27",2014,June
"田中 敦,宇津木貴太,石崎超矢,西山昭雄,塩田 忠,櫻井 修,篠崎和夫,脇谷尚樹","Al(CH<sub>3</sub>)<sub>3</sub>を原料とするMOCVD法によるAl<sub>2</sub>O<sub>3</sub>薄膜の製膜過程","日本セラミックス協会第29回関東支部研究発表会","日本セラミックス協会第29回関東支部研究発表会予稿集",,,,"  2A04",2013,Sept.
"石崎超矢,田中 敦,西山昭雄,塩田 忠,櫻井 修,篠崎和夫,脇谷尚樹","MOCVD法によるSi基板上へのアルミナ薄膜の形成","日本セラミックス協会第32回エレクトロセラミックス研究討論会","日本セラミックス協会第32回エレクトロセラミックス研究討論会講演予稿集",,,"  2P10","p. 50",2012,Oct.
"A.Tanaka,Y.Tsuchiya,kouichi usami,S Saito,T.Arai,H.Mizuta,S.Oda","Synthesis of Assembled Nanocrystalline Si Dots Film by the Langmuir-Blodgett Technique",,"Japanese Journal of Applied Physics",,"Vol. 47 (5)",,"pp. 3731-3734",2008,May
"Hea-Jeong Cheong,Daihei Hippo,Atsushi Tanaka,Kouichi Usami,Yoshishige Tsuchiya,Hiroshi Mizuta,Shunri Od","Visible Electroluminescence from Size-Controlled Silicon Quantum Dots","CLEO/QELS 2006",,,,,,2006,May