"‰Z¶“µ”ü,’·”ör—C,•½ŽR”Ž”V,’†’ÒŠ°","(In,Bi)/Si(111)•\–Ê‚ÌŒ´Žq\‘¢","“ú–{•¨—Šw‰ï2023”Nt‹G‘å‰ï",,,,,,2023,Mar. "’·”ör—C,‘å“à‘ñŽÀ,‰Z¶“µ”ü,D“cFK,”Ñ·‘ñŽk,¬X•¶•v,’†’ÒŠ°,•½ŽR”Ž”V","Si(111)ã3~ã3-Ag •\–Êã‚ÌBi(110)’´”––Œ‚Ì“dŽqó‘Ô","“ú–{•¨—Šw‰ï2023”Nt‹G‘å‰ï",,,,,,2023,Mar. "XˆäŽµ¶,‰i—FŒc,’|‘ºWˆê,‘å“à‘ñŽÀ,‰Z¶“µ”ü,’·”ör—C,‰Í“Y—‰›,”Ñ·‘ñŽk,¬X•¶•v,•½ŽR”Ž”V,’†’ÒŠ°","Cu(001)c(4~2)-Bi•\–Ê‚Ì“dŽqó‘Ô","2021”N“ú–{•\–Ê^‹óŠw‰ïŠwpu‰‰‰ï",,,,,,2021,Nov. "N. Morii,K. Nagatomo,K. Takemura,T. Ouchi,H. Uryu,S. Nagao,R. Kawazoe,T. Iimori,F. Komori,H. Hirayama,K. Nakatsuji","Electronic structure of Cu(001)c(4~2)-Bi surface","13th International Symposium on Atomic Level Characterization for New Materials and Devices (ALCf21)",,,,,,2021,Oct.