"Suguru Ushiro,Haruka Mikami,Mizuki Sato,Chiharu Hirano,Yoshinori Suzuki,Rina Maeda,Yoshihito Ishida,Teruaki Hayakawa,Aida Kohei,Yasuhiko Tada,Hiroshi Yoshida","Selective are morphology control of self-assembled patterns using silsesquioxane-containing block copolymers",,"Journal of Photopolymer Science and Technology",,"Vol. 25","No. 1","pp. 83-86",2012,June