"T. Yuji,N. Mungkung,A. Kobayashi,Y. Suzaki,H. Akatsuka","Diagnostics of Vibration and Rotational Temperatures in Atmospheric-Pressure Non-Equilibrium Discharge Electrodeless-Type Microwave Plasma Jet","The Japan ? Thailand ? Lao P.D.R. Joint Friendship International Conference on Applied Electrical and Mechanical Engineering 2011","Proc. the Japan ? Thailand ? Lao P.D.R. Joint Friendship International Conference on Applied Electrical and Mechanical Engineering 2011","Dept. Electrical Technology Education King Mongkut's University of Technology Thonburi (KMUTT)",,,"pp. 301-304",2011,Sept.
"T. Yuji,Y. Kiyota,Y. Okamura,H. Kinoshita,N. Mungkung,Y. Suzaki,T. Hamada,H. Akatsuka","Cleaning Process for Semiconductor Equipment Process on Atmospheric-Pressure Non-Equilibrium DC Pulse Plasma Jet","The Japan ? Thailand ? Lao P.D.R. Joint Friendship International Conference on Applied Electrical and Mechanical Engineering 2011","Proc. the Japan ? Thailand ? Lao P.D.R. Joint Friendship International Conference on Applied Electrical and Mechanical Engineering 2011","Dept. Electrical Technology Education King Mongkut's University of Technology Thonburi (KMUTT)",,,"pp. 51-54",2011,Sept.
"Toshifumi Yuji,HIROSHI AKATSUKA,Yoshifumi Suzaki,Hiroshi Shibata,Shinichi Tashiro,Manabu Tanaka","Radical Simulation in Atmospheric-pressure Non-equilibrium DC Pulse Plasma of Euler's Method","Technical Meeting on Plasma Science and Technology","The Papers of Technical Meeting on Plasma Science and Technology, IEE Japan","The Institute of Electrical Engineers of Japan","Vol. PST-11-063~070",,"pp. 21-24",2011,Aug.
"Toshifumi Yuji,Narong Mungkung,Yuichi Kiyota,Daishiro Uesugi,Minobu Kawano,Kenichi Nakabayashi,Hisaaki Kataoka,Yoshifumi Suzaki,Nobuki Kashihara,Hiroshi Akatsuka","Surface Modi?cation of Si Wafer by Low-Pressure  High-Frequency Plasma Chemical Vapor  Deposition Method",,"IEEE Trans. Plasma Sci.","IEEE","Vol. 39","No. 6","pp. 1427-1431",2011,June
"Toshifumi Yuji,清田佑一,川野美延,中林健一,田代真一,田中学,HIROSHI AKATSUKA","Optical Emission Spectroscopy Measurement of High-frequency Low-pressure at Plasma-enhanced Chemical Vapor Deposition","The 2011 Annual Meeting, I.E.E. Japan","The 2011 Annual Meeting Record, I.E.E. Japan","The Institute of Electrical Engineers of Japan",,"# 1","p. 241",2011,Mar.