"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF<sub>2</sub>/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",,"  SIIE03-1",2020,Apr.
"Takumi Kaneko,Yoshiro Kumagai,Koudai Hirose,Hiroki Tonegawa,Kizashi Mikami,Kanta Tomizawa,Honami Sato,Masahiro Watanabe","Analysis of resistance switching characteristics of CaF<sub>2</sub>/Si/CaF<sub>2</sub> quantum-well structures","The 67th The Japan Society of Applied Physics Spring Meeting",,"The Japan Society of Applied Physics",,,"p. 11-140",2020,Mar.
"Honami Sato,Yoshiro Kumagai,Kizashi Mikami,Hiroki Tonegawa,Koudai Hirose,Kanta Tomizawa,Takumi Kaneko,Masahiro Watanabe","Room Temperature Negative Differential Resistance of Si/CaF<sub>2</sub> p-type Triple-barrier Resonant Tunneling Diodes","The 67th The Japan Society of Applied Physics Spring Meeting",,"The Japan Society of Applied Physics",,,"p. 11-139",2020,Mar.