"Noriyuki Taoka,Osamu Nakatsuka,Yoriko Mizushima,Hideki Kitada,Young Suk Kim,Tomoji Nakamura,Takayuki Ohba,Shigeaki Zaima","Observation of lattice spacing fluctuation and strain undulation around through-Si vias in wafer-on-wafer structures using X-ray microbeam diffraction",,"Japanese Journal of Applied Physics",,"Volume 53",,,2014,Apr.
"Mizushima Yoriko,Kim Youngsuk,Nakamura Tomoji,Sugie Ryuichi,Hashimoto Hideki,Uedono Akira,Ohba Takayuki","Impact of back-grinding-induced damage on Si wafer thinning for three-dimensional integration",,"Jpn. J. Appl. Phys.","Institute of Physics","Vol. 53","No. 5",,2014,Apr.
"Akira Uedono,Yoriko Mizushima,Youngsuk Kim,Tomoji Nakamura,Takayuki Ohba,Nakaaki Yoshihara,Nagayasu Oshima,Ryoichi Suzuki","Vacancy-type defects induced by grinding of Si wafers studied by monoenergetic",,"Journal of Applied Physics","AIP","Vol. 116","  134501",,2014,