"Hiroki Moriwake,Rie Yokoi,Ayako Taguchi,Takafumi Ogawa,Craig A. J. Fisher,Akihide Kuwabara,Yukio Sato,Takao Shimizu,Yosuke Hamasaki,Hiroshi Takashima,Mitsuru Itoh","A computational search for wurtzite-structured ferroelectrics with low coercive voltages",,"APL Materials","American Institute of Physics","Vol. 8","Issue 12","p. 121102",2020,Dec.
"Hidehisa Inoue,Takao Shimizu,HIROSHI FUNAKUBO","PZT膜の電圧印可による結晶構造変化",,"文部科学省ナノテクノロジープラットフォーム事業 微細構造解析プラットフォーム 利用報告書 実施機関 国立大学法人 東北大学",,"  令和元年度",,"  A-19-TU-0003",2020,Sept.
"Shinnosuke Yasuoka,Takao Shimizu,HIROSHI FUNAKUBO","窒化物圧電体膜の微構造評価",,"文部科学省ナノテクノロジープラットフォーム事業 微細構造解析プラットフォーム 利用報告書 実施機関 国立大学法人 東北大学",,"  令和元年度",,"  A-19-TU-0048",2020,Sept.
"Takanori Mimura,Reijiro Shimura,HIROSHI FUNAKUBO,Takao Shimizu","HfO2およびZrO2基強誘電体膜の厚膜化と室温合成",,"超音波TECHNO",,"  2020年9-10号",,"  41-45",2020,Sept.
"Takao Shimizu,HIROSHI FUNAKUBO","新規非鉛圧電体の時間分解Ｘ線回折による電場応答の観察",,"文部科学省ナノテクノロジープラットフォーム事業 微細構造解析プラットフォーム 利用報告書 実施機関 国立研究開発法人物質・材料研究機構",,"  令和元年度",,"  A-19-NM-0004",2020,Sept.
"Takao Shimizu,HIROSHI FUNAKUBO","２相共存PZTにおける電場有機相転移の観察",,"文部科学省ナノテクノロジープラットフォーム事業 微細構造解析プラットフォーム 利用報告書 実施機関 国立研究開発法人物質・材料研究機構",,"  令和元年度",,"  A-19-NM-0086",2020,Sept.
"Akinori Tateyama,Yoshiharu Ito,Takao Shimizu,yuichiro orino,Minoru Kuribayashi Kurosawa,HIROSHI FUNAKUBO","水熱合成法で作製した(KxNa1-x)NbO３自己分極膜の縦振動を用いた正逆圧電応答の同時評価","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"yoshitaka Ehara,Takaaki Nakashima,Daichi Ichinose,Takao Shimizu,ken nishida,Tomoaki Yamada,HIROSHI FUNAKUBO","面内分極配向したPbTiO3薄膜のa1/a2ドメイン構造の膜厚依存","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Masanori Kodera,Takao Shimizu,HIROSHI FUNAKUBO","Bi2SiO5エピタキシャル薄膜の結晶成長に関する検討","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"上原雅人,Shinnosuke Yasuoka,Takao Shimizu,山田浩志,秋山守人,HIROSHI FUNAKUBO","スパッタリング法で作製したGaNおよびSc添加GaN薄膜の強誘電性評価","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Shinnosuke Yasuoka,Takao Shimizu,上原雅人,HIROSHI FUNAKUBO","(Al1-xScx)N薄膜の強誘電特性に及ぼす製膜条件の影響","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Masanori Kodera,Ayako Taguchi,Takao Shimizu,Hiroki Moriwake,Hiroshi Funakubo","Fabrication and characterization of ReO3-type dielectric films",,"J. Mater. Chem. C",,"Vol. 8","No. 14","pp. 4680-4684",2020,Mar.
"Masanori Kodera,田口綾子,Takao Shimizu,森分博紀,HIROSHI FUNAKUBO","ReO3構造を有する酸フッ化物薄膜の誘電特性","日本セラミックス協会2020年年会",,,,,,2020,Mar.
"Yoshiharu Ito,Akinori Tateyama,Takao Shimizu,Minoru Kuribayashi Kurosawa,HIROSHI FUNAKUBO","水熱合成法を用いたエピタキシャル(Bi, K)TiO3薄膜の合成と評価","日本セラミックス協会2020年年会",,,,,,2020,Mar.
"Reijiro Shimura,Takanori Mimura,Akinori Tateyama,Takao Shimizu,HIROSHI FUNAKUBO","スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Takanori Mimura,Takao Shimizu,HIROSHI FUNAKUBO","エピタキシャルHfO2基膜を用いた直方晶相安定化の調査","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Keisuke Ishihama,Akinori Tateyama,Takao Shimizu,佐藤裕介,山岡和希子,石田未来,HIROSHI FUNAKUBO","PLD法で作製した正方晶(1-x)(Bi,Na)TiO3-xBaTiO3膜の評価","第67回応用物理学会春季学術講演会",,,,,,2020,Mar.
"Masanori Kodera,HIROSHI FUNAKUBO,Takao Shimizu","Bi2SiO5エピタキシャル薄膜の作製と強誘電性","第4回元素戦略シンポジウム―産学連携研究新展開―",,,,,,2020,Feb.
"Takao Shimizu,Takanori Mimura,HIROSHI FUNAKUBO","HfO2基強誘電体の相安定性と厚膜化","第4回元素戦略シンポジウム―産学連携研究新展開―",,,,,,2020,Feb.
"HIROSHI FUNAKUBO,伊藤満,Satoshi Wada,Naoki Ohashi,谷口博基,Takao Shimizu","パワーデバイスやIoT用途の誘電体材料の創出","第4回元素戦略シンポジウム―産学連携研究新展開―",,,,,,2020,Feb.
"Takanori Mimura,Takao Shimizu,Yoshio Katsuya,Osami Sakata,Hiroshi Funakubo","Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films",,"Jpn. J. Appl. Phys.",,"Vol. 59",,"pp. SGGB04-1-6",2020,Feb.
"Takanori Mimura,Takao Shimizu,Hiroshi Uchida,Hiroshi Funakubo","Room-temperature deposition of ferroelectric HfO2-based films by the sputtering metho",,"Appl. Phys. Lett.",,"Vol. 116",,"pp. 062901-1-5",2020,Feb.
"Hidehisa Inoue,Akinori Tateyama,Takao Shimizu,HIROSHI FUNAKUBO","MOCVD法で作製した組成相境界近傍組成を有するエピタキシャルPZT膜の結晶構造および圧電性評価","第58回セラミックス基礎科学討論会",,,,,,2020,Jan.
"Kodai Aoyama,Takao Shimizu,Hideto Kuramochi,Masami Mesuda,Ryo Akiike,Keisuke Ide,Takayoshi Katase,Toshio Kamiya,Yoshisato Kimura,Hiroshi Funakubo","Fabrication and characterization of CaxSr1-x)Si2 films prepared by co-sputtering method",,"MRS Advances",,,,,2020,Jan.
"Kodai Aoyama,Takao Shimizu,Hideto Kuramochi,Masami Mesuda,Ryo Akiike,Keisuke Ide,Takayoshi Katase,Toshio Kamiya,Yoshisato Kimura,Hiroshi Funakubo","Thermoelectric (BaxSr1?x)Si2 films prepared by sputtering method over the barium solubility limit",,"Jpn. J. Appl. Phys.",,"vol. 59",,"p. SFFB02-1-6",2020,Jan.
"青山航大,清水荘雄,倉持豪人,召田雅実,秋池良,井手啓介,片瀬貴義,神谷利夫,舟窪浩","二元同時スパッタ法で作製したAeSi2 膜(Ae= Ca, Sr, Ba)の構成相と電気特性","日本セラミックス協会 第58回セラミックス基礎科学討論会",,,,,,2020,Jan.
"Atsuo Katagiri,Shota Ogawa,Takao Shimizu,Masaaki Matsushima,Kensuke Akiyama,Hiroshi Uchida,Hiroshi Funakubo","Epitaxial growth of Mg2Si films on (111) Si substrates covered with epitaxial SiC layers",,"Jpn. J. Appl. Phys.",,"Vol. 59",,"pp. SF1001-1-4",2020,Jan.
"Yuki Tashiro,Takanori Mimura,Takao Shimizu,Yoshio Katsuya,Osami Sakata,Takanori Kiguchi,Takahisa Shiraishi,Toyohiko Konno,HIROSHI FUNAKUBO","HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性","第58回セラミックス基礎科学討論会",,,,,,2020,Jan.
"Keisuke Ishihama,Akinori Tateyama,Takao Shimizu,佐藤裕介,山岡和季子,石田未来,HIROSHI FUNAKUBO","PLD法で作製した正方晶(1-x)(Bi,Na)TiO3-xBiTiO3膜の作製と評価","第58回セラミックス基礎科学討論会",,,,,,2020,Jan.
"Shinnosuke Yasuoka,Takao Shimizu,上原雅人,HIROSHI FUNAKUBO","二元同時スパッタリング法によるAl1-xScxN薄膜の作製と強誘電性評価","第58回セラミックス基礎科学討論会",,,,,,2020,Jan.