"Ryosuke Kajikawa,Takamasa Kawanago,Iriya Muneta,Takuya Hoshii,Kuniyuki KAKUSHIMA,KAZUO TSUTSUI,Hitoshi Wakabayashi","トップゲートに自己整合したWOx S/Dを用いた30-50 nm膜厚WSe2バックチャネルpFET","84th JSAP Autumn meeting",,,,,,2023,Sept.
"Ryosuke Kajikawa,Takamasa Kawanago,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-Aligned WOx S/D Contacts to Gate Stacks with TiOx Nucleation Layer by Multiple-Deposition Method in WSe2 pFETs","International Conference on Solid State Devices and Materials",,,,,,2023,Sept.