"K. Kakushima,K. Tachi,M. Adachi,K. Okamoto,S. Sato,J. Song,T. Kawanago,P. Ahmet,K. Tsutsui,N. Sugii,T. Hattori,H. Iwai","Advantage of La2O3 Gate Dielectric Over HfO2 for Direct Contact and Mobility Improvment","the 38th European Solid-State Device Research Conference (ESSDERC2008)",,,,,,2008,Sept.