"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Keisuke Ichikawa,Masahiro Watanabe","Negative Differential Resistance in CaF<sub>2</sub>/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process","32nd International Microprocesses and Nanotechnology Conference (MNC2019)",,"The Japan Society of Applied Physics",,,,2019,Oct.
"—˜�ª�ì Œ[Šó,ŒF’J ‰À˜Y,ŽO�ã –G,œA�£ á©‘å,•yàV Š¨‘¾,‹àŽq ‘ñŠC,�²“¡ •ä”g,“n•Ó �³—T","Si/CaF<sub>2</sub>ŽO�d�á•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI�[ƒh‚Ì�‚ƒs�[ƒN“d—¬–§“x‚ð—L‚·‚鎺‰·”÷•ª•‰�«’ï�R“Á�«","‘æ80‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï",,"‰ž—p•¨—�Šw‰ï",,,"p. 12-340",2019,Sept.
"•yàV Š¨‘¾,ŒF’J ‰À˜Y,—˜�ª�ì Œ[Šó,ŽO�ã –G,œA�£ á©‘å,‹àŽq ‘ñŠC,�²“¡ •ä”g,“n•Ó �³—T","CaF<sub>2</sub>/Si/SiO<sub>2</sub>“ñ�d�á•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI�[ƒh‚ÌŽº‰·”÷•ª•‰�«’ï�R“Á�«","‘æ80‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï",,"‰ž—p•¨—�Šw‰ï",,,"p. 12-341",2019,Sept.
"ŽO�ã –G,ŒF’J ‰À˜Y,œA�£ á©‘å,•yàV Š¨‘¾,—˜�ª�ì Œ[Šó,‹àŽq ‘ñŠC,�²“¡ •ä”g,“n•Ó �³—T","Œ´Žq‘w”––ŒCaF<sub>2</sub>/Siƒwƒeƒ��\‘¢‚ð—p‚¢‚½ƒz�[ƒ‹‹ì“®‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI�[ƒh‚ÌŽº‰·”÷•ª•‰�«’ï�R“Á�«","‘æ80‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï",,"‰ž—p•¨—�Šw‰ï",,,"p. 12-342",2019,Sept.
"œA�£ á©‘å,ŒF’J ‰À˜Y,—˜�ª�ì Œ[Šó,•yàV Š¨‘¾,‹àŽq ‘ñŠC,�²“¡ •ä”g,“n•Ó �³—T","Si/CaF<sub>2</sub>ƒoƒCƒ|�[ƒ‰“ñ�d�á•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI�[ƒh‚ÌŽº‰·”÷•ª•‰�«’ï�R“Á�«","‘æ80‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï",,"‰ž—p•¨—�Šw‰ï",,,"p. 12-343",2019,Sept.