"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF<sub>2</sub>/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",,"  SIIE03-1",2020,Apr.
"‹āŽq ‘ņŠC,ŒF’J ‰Ā˜Y,œAĢ áБå,—˜ŠėŒ[Šó,ŽOã –G,•yāV ŠĻ‘ū,ē“Ą•ä”g,“n•Óģ—T","CaF<sub>2</sub>/Si/CaF<sub>2</sub>‹Ī–ƒgƒ“ƒlƒ‹—ĘŽqˆäŒË\‘Ē‚ð—p‚Ē‚―’ïRƒXƒCƒbƒ`ƒ“ƒO“ÁŦ‚Ė—˜_‰ðÍ","‘æ67‰ņ‰ž—p•Ļ—Šw‰ït‹GŠwpu‰‰‰ï",,"‰ž—p•Ļ—Šw‰ï",,,"p. 11-140",2020,Mar.
"ē“Ą •ä”g,ŒF’J ‰Ā˜Y,ŽOã –G,—˜Šė Œ[Šó,œAĢ áБå,•yāV ŠĻ‘ū,‹āŽq ‘ņŠC,“n•Ó ģ—T","Si/CaF<sub>2</sub> pŒ^ŽOdá•Į‹Ī–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚ĖŽš‰·”ũ•Š•‰Ŧ’ïR“ÁŦ","‘æ67‰ņ‰ž—p•Ļ—Šw‰ït‹GŠwpu‰‰‰ï",,"‰ž—p•Ļ—Šw‰ï",,,"p. 11-139",2020,Mar.