"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",," SIIE03-1",2020,Apr.
"ēĄ äg,FJ ĀY,Oã G,Šė [ó,AĢ áĐå,yāV Ļū,āq ņC,nÓ ģT","Si/CaF2 p^OdáĮĪÂgl_CI[hĖš·ũŠŦïRÁŦ","æ67ņpĻwïtGwpuï",,"pĻwï",,,"p. 11-139",2020,Mar.
"āq ņC,FJ ĀY,AĢ áĐå,Šė[ó,Oã G,yāV Ļū,ēĄäg,nÓģT","CaF2/Si/CaF2ĪÂglĘqäË\ĒðpĒ―ïRXCb`OÁŦĖ_ðÍ","æ67ņpĻwïtGwpuï",,"pĻwï",,,"p. 11-140",2020,Mar.