"‘ê–{‘בå,‰© •k,“nç²�³�l,–x“c‰hŠì","“¯Ž²2�d‰~“›ƒmƒYƒ‹Œ^“d‹É‚ð—p‚¢‚½ƒKƒXƒWƒFƒbƒgŒ^•ú“d�¶�¬ƒvƒ‰ƒYƒ}ŒõŒ¹‚ÉŠÖ‚·‚錤‹†","ƒvƒ‰ƒYƒ}�^ƒpƒ‹ƒXƒpƒ��[�‡“¯Œ¤‹†‰ï","“d‹CŠw‰ïŒ¤‹†‰ïŽ‘—¿","“d‹CŠw‰ï",,"  PST-10-79/PPT-10-99","pp. 63-65",2010,Dec.
"B. Huang,Y. Takimoto,M. Watanabe,E. Hotta","Xe-based Gas Jet Type Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithography","23rd International Microprocesses and Nanotechnology Conference",,,,,"  12D-11-1",2010,Nov.
"“nç²�³�l,Žðˆä—Y—S,Žé �H�Î,‰© •k,�Î’Ë—T–ç,‘ê–{‘בå,–x“c‰hŠì","’á‹Cˆ³•ú“dƒvƒ‰ƒYƒ}‚ð—p‚¢‚½’Z”g’·ŒõŒ¹‚ÌŠJ”­","•½�¬22”N“d‹CŠw‰ïŠî‘b�E�Þ—¿�E‹¤’Ê•”–å‘å‰ï","•½�¬22”N“d‹CŠw‰ïŠî‘b�E�Þ—¿�E‹¤’Ê•”–å‘å‰ï","“d‹CŠw‰ï",,,"  CD",2010,Sept.
"Bin Huang,Yasuhiro Takimoto,Masato Watanabe,Eiki Hotta","Xe-based Z-pinch gas jet type DPP EUV source for lithography","Joint Technical Meeting on Plasma Science and Pulsed Power Technology","The Papaers of Joint Technical Meeting on Plasma Science and Pulsed Power Technology","IEEJ",,"  PST-10-034, PPT-10-055",,2010,Aug.
"Eiki Hotta,Yusuke Sakai,Zhu Qiushi,Yuya Ishizuka,Yasuhiro Takimoto,Huang Bin,Masato Watanabe","R&D of EUV and SXR Light Sources at Tokyo Institute of Technology","2010 Academic Symposium on Optoelectronics and Microelectronics Technology and the 10th Chinese-Russian Symposium on Laser Physics and Laser Technologies","2010 Academic Symposium on Optoelectronics and Microelectronics Technology and the 10th Chinese-Russian Symposium on Laser Physics and Laser Technologies","Harbin Institute of Technology",,,"  CD",2010,July
"Bin Huang,Yasuhiro Takimoto,Masato watanabe,Eiki Hotta","Xe-based Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithograph","Technical Meeting on Pulsed Power Technology","The papers of Technical Meeting on Pulsed Power Technology","IEE Japan",,"  PPT-10-23","pp. 15-18",2010,Feb.