"置塩貴雄,高村陽太,菅原聡","CoFe/Mg/AlOx/Siデピン接合を用いた低バリア強磁性ソース/ドレインMOSFET","第16回半導体スピン工学の基礎と応用(PASPS-16)",,,,,"p. 75",2011,Nov.
"高村陽太,林建吾,影井泰次郎,周藤悠介,菅原聡","ラジカル酸窒化膜を用いたCFS/SiOxNy/Siトンネル接合の形成と構造評価","第16回半導体スピン工学の基礎と応用(PASPS-16)",,,,,"p. 41",2011,Nov.
"M. Satoh,Y. Takamura,S. Sugahara","Preparation and characterization of L21-ordered full-Heusler Co2FeSi1-xAlx alloy thin films formed by rapid thermal annealing","International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists",,,"  paper P-41",,"pp. 129-130",2011,Oct.
"Y. Takamura,S. Sugahara","Analysis and Design of Hanle-Effect Spin Transistors at 300 K",,"IEEE Magn. Lett.",,"Vol. 2",,"pp. 3000404/1-4",2011,Oct.
"Y. Takamura,S. Sugahara","Analysis and design of Hanle-effect spin-transistor","International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists",,,,,"pp. 125-126",2011,Oct.
"Y. Takamura,S. Sugahara","Analysis of the Hanle effect in Si MOS inversion channels at 300K","56th Annual Conf. on Magnetism and Magnetic Materials (MMM)",,,"  HB-12",,"pp. 548-529",2011,Oct.
"Y. Takamura,K. Hayashi,Y. Shuto,S. Sugahara","Formation and structural analysis of half-metallic Co2FeSi/SiOxNy/Si contacts with radical-oxynitridation-SiOxNy tunnel barrier","International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists",,,"  paper P-40",,"pp. 127-128",2011,Oct.
"T. Okishio,Y. Takamura,S. Sugahara","Low-barrier ferromagnet source/drain MOSFETs using CoFe/Mg/AlOx/Si depinning contacts","International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists",,,"  paper P-42",,"pp. 131-132",2011,Oct.
"高村陽太,菅原聡","スピンMOSFET におけるHanle 効果の解析","第72回応用物理学会学術講演会",,,"  2p-P-24",,,2011,Sept.
"?村 陽太,林 建吾,周藤 悠介,菅原 聡","ラジカル酸窒化法を用いたCo2FeSi/SiOxNy/Siトンネル接合の形成","第72回応用物理学会学術講演会",,,"  31p-ZS-12",,,2011,Sept.
"T. Okishio,Y. Takamura,S. Sugahara","Fabrication of spin-MOSFETs using CoFe/Mg/AlOx/Si tunnel junctions for the source and drain","International Conf. on Solid State Devices and Materials (SSDM)",,,"  J-4-4",,"p. 31",2011,Sept.
"置塩貴雄,高村陽太,菅原聡","CoFe/Mg/AlOx/Siトンネル構造をソース/ドレインに用いたスピンMOSFETの作製","第72回応用物理学会学術講演会",,,"  1p-P10-25",,,2011,Aug.
"M. Satoh,Y. Takamura,S. Sugahara","Characterization of L21-ordered full-Heusler Co2FeSi1-xAlx alloy thin films formed by silicidation technique employing a silicon-on-insulator substrate","Electronic Materials Conf. (EMC) 2011",,,"  DD-10",,"p. 96",2011,June
"Y. Takamura,K. Hayashi,Y. Shuto,S. Sugahara","Formation of half-metallic tunnel junctions of Co2FeSi/SiOxNy/Si using radical oxynitridation technique","Electronic Materials Conf. (EMC) 2011",,,"  DD-9",,"p. 96",2011,June
"Y. Takamura,T. Sakurai,R. Nakane,Y. Shuto,S. Sugahara","Epitaxial germanidation of full-Heusler Co2FeGe alloy thin films formed by rapid thermal annealing",,"J. Appl. Phys.","American Institute of Physics","Vol. 109","no. 7","pp. 07B768/1-3",2011,Apr.
"林建吾,高村陽太,周藤悠介,菅原聡","RTA法を用いたCo2FeSiの形成における初期多層膜構造の影響","第58回応用物理学関係連合講演会",,,"  25a-KM-10",,,2011,Mar.
"佐藤 充浩,?村 陽太,菅原 聡","RTAを用いたフルホイスラー合金Co2FeSi1-xAlxの形成と評価(2)","第58回応用物理学関係連合講演会",,,"  25a-KM-11",,,2011,Mar.
"Y. Shuto,Y. Takamura,S. Sugahara","Spin-functional MOSFETs based on half-metallic ferromagnet technology","Workshop on Heusler Alloys and Their Spintronics Applications",,,,,,2011,Jan.