"H. Kataoka,N. Mungkung,T. Yuji,M. Kawano,Y. Kiyota,D. Uesugi,K. Nakabayashi,Y. Suzaki,H. Shibata,N. Kashihara,K. Sakai,T. Bouno,H. Akatsuka","Surface modification of silicon wafer by low-pressure high-frequency plasma chemical vapor deposition method","2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)","2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)","IEEE",,,"pp. 505 - 508",2010,Aug.
"Toshifumi YUJI,Takuya URAYAMA,Shuitsu FUJII,Yoshitoki IIJIMA,Yoshifumi SUZAKI,Hiroshi AKATSUKA","Basic Characteristics for PEN Film Surface Modification Using Atmospheric-Pressure Nonequilibrium Microwave Plasma Jet",,"Electronics and Communications in Japan","Wiley Periodicals Inc.","Vol. 93","No. 5","pp. 42-49",2010,May
"湯地敏史,青木慎二,河野唯通,赤塚洋","大気圧非平衡放電プラズマジェットによる表面処理試料の空間電荷分布測定","平成２２年電気学会全国大会","平成２２年電気学会全国大会講演論文集","電気学会",,,"p. 243",2010,Mar.