"今井 慎也,梶川 亮介,川那子 高暢,宗田 伊理也,角嶋 邦之,辰巳 哲也,冨谷 茂隆,筒井 一生,若林 整","スパッタMoS2膜に対するエッジ金属コンタクトの電流電圧特性","第84回応用物理学会秋季学術講演会",,,,,,2023,Sept.
"Ryo Ono,Shinya Imai,Takamasa Kawanago,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Shinya Imai,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"今井 慎也,小野 凌,宗田 伊理也,角嶋 邦之,辰巳 哲也,冨谷 茂隆,筒井 一生,若林 整","MoS2膜質のスパッタ成膜レート依存性調査","第83回応用物理学会秋季学術講演会",,,,,,2022,Sept.
"Taiga Horiguchi,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Positive Seebeck coefficient of niobium-doped MoS2 film deposited by sputtering and activated by sulfur vapor annealing",,"Japanese Journal of Applied Physics",,"Vol. 61",,"  075506",2022,July
"Takuya Hamada,Masaya Hamada,Taiga Horiguchi,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","High Seebeck Coefficient in PVD-WS2 Film with Grain-Size Enlargement",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,Feb.
"Takuya Hamada,Taiga Horiguchi,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Grain Size Enlargement in 2D WS2 Film with Low-Power RF-Magnetron Sputtering","Internatonal Conference on Solid State Devices and Materials",,,,,,2021,Sept.
"Takuya Hamada,Masaya Hamada,Satoshi Igarashi,Taiga Horiguchi,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET with TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box",,"Journal of the Electron Devices Society (J-EDS)",,"Vol. 9",,"p. 1117",2021,Aug.
"Shinya Imai,Takuya Hamada,Masaya Hamada,Takanori Shirokura,Shigetaka Tomiya,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Kazuo Tsutsui,Hitoshi Wakabayashi","Importance of MoS2-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication","International Conference of Solid State Devices and Materials (SSDM) 2020",,,,,,2020,Sept.
"堀口 大河,濱田 拓也,辰巳 哲也,冨谷 茂隆,星井 拓也,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜のSF6プラズマ処理によるシート抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"濱田 拓也,堀口 大河,辰巳 哲也,冨谷 茂隆,濱田 昌也,星井 拓也,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜のCl2プラズマ処理によるシート抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.