"T. Ohashi,K. Suda,S. Ishihara,N. Sawamoto,S. Yamaguchi,K. Matsuura,K. Kakushima,N. Sugii,A. Nishiyama,Y. Kataoka,K. Natori,K. Tsutsui,H. Iwai,A. Ogura,H. Wakabayashi","Multi-layered MoS2 film formed by high-temperature sputtering for enhancement-mode nMOSFETs",,"Japan Journal of Applied Physics",,"Vol. 54","No. 4S",,2015,Mar.
"Y. Hibino,S. Ishihara,N. Sawamoto,T. Ohashi,K. Matsuura,H. Machida,M. Ishikawa,H. Sudoh,H. Wakabayashi,A. Ogura","Low Temperature Formation of Layered MoS2 by Sulfurization of E-Beam Evaporated Mo Thin Film Using (t-C4H9)2S2","MRS Fall Meeting & Exhibit",,,,,,2015,
"S. Ishihara,Y. Hibino,N. Sawamoto,K. Suda,T. Ohashi,K. Matsuura,H. Machida,M. Ishikawa,H. Sudoh,H. Wakabayashi,A. Ogura","Fabrication of High-Quality Single- and Few-Layer MoS2 Films by Combination of Sputtering Deposition and Post-Deposition Sulfurization Annealing","MRS Fall Meeting & Exhibit",,,,,,2015,
"S. Ishihara,Y. Hibino,N. Sawamoto,K. Suda,T. Ohashi,K. Matsuura,H. Machida,M. Ishikawa,H. Sudoh,H. Wakabayashi,A. Ogura","Properties of Single-Layer MoS2 Film Fabricated by Combination of Sputtering Deposition and Post-Deposition Sulfurization Annealing Using (t-C4H9)2S2","International Microprocesses and Nanotechnology Conference (MNC)",,,,,,2015,
"S. Ishihara,K. Suda,Y. Hibino,N. Sawamoto,T. Ohashi,S. Yamaguchi,K. Matsuura,H. Machida,M. Ishikawa,H. Sudoh,H. Wakabayashi,A. Ogura","Improving Crystalline Quality of Sputtering Deposited MoS2 Thin Film by Post-Deposition Sulfurization Annealing Using (t-C4H9)2S2","International Conference on Solid State Devices and Materials",,,,,,2015,
"S. Ishihara,K. Suda,Y. Hibino,N. Sawamoto,T. Ohashi,S. Yamaguchi,K. Matsuura,H. Machida,M. Ishikawa,H. Sudoh,H. Wakabayashi,A. Ogura","Evaluation of Sputtering Deposited 2-Dimensional MoS2 Film by Raman Spectroscopy",,"MRS Proceedings",,"  1781",,"  11",2015,