"Masaya Hamada,Kentaro Matsuura,Takuro Sakamoto,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","High Hall-Effect Mobility of Large-Area Atomic-Layered Polycrystalline ZrS2 Film using UHV RF Magnetron Sputtering and Sulfurization",,"Journal of the Electron Devices Society (J-EDS)","IEEE","Vol. 7","No. 1","pp. 1258-1263",2019,Dec.
"今井 慎也,濱田 昌也,五十嵐 智,宗田 伊理也,角嶋 邦之,筒井 一生,若林 整","硫化プロセスにおけるスパッタMoS2膜質向上の重要性","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"五十嵐 智,望月 祐輔,谷川 晴紀,濱田 昌也,松浦 賢太朗,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜とTiSi2膜の界面におけるFGアニールによるコンタクト抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"濱田 昌也,松浦 賢太朗,宗田 伊理也,星井 拓也,角嶋 邦之,筒井 一生,若林 整","スパッタ法と硫黄雰囲気アニールで成膜した高いホール効果移動度を持つ層状ZrS2膜","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"濱田 拓也,堀口 大河,辰巳 哲也,冨谷 茂隆,濱田 昌也,星井 拓也,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜のCl2プラズマ処理によるシート抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"K. Matsuura,M. Hamada,T. Hamada,H. Tanigawa,T. Sakamoto,W. Cao,K. Parto,A. Hori,I. Muneta,T. Kawanago,K. Kakushima,K. Tsutsui,A. Ogura,K. Banerjee,H. Wakabayashi","Normally-Off Sputtered-MoS2 nMISFETs with MoSi2 Contact by Sulfur Powder Annealing and ALD Al2O3 Gate Dielectric for Chip Level Integration","Int. Workshop on Juction Technology (IWJT2019)",,,,,,2019,June
"Masaya Hamada,Kentaro Matsuura,Takuro Sakamoto,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","High Hall-Effect Mobility of Atomic-Layered Polycrystalline-ZrS2 Film using Sputtering and Sulfur Annealing","3rd Electron Devices Technology and Manufactureing Conference (EDTM2019)",,,,,,2019,Mar.
"松浦 賢太朗,濱田 昌也,坂本 拓朗,谷川 晴紀,宗田 伊理也,石原 聖也,角嶋 邦之,筒井 一生,小椋 厚志,若林 整","F.G.アニールによるMoSi2/スパッタMoS2界面コンタクト抵抗低減","第66回応用物理学会春期学術講演会",,,,,,2019,Mar.