"Joel Molina-Reyes,Takuya Hoshii,Shun-Ichiro Ohmi,Hiroshi Funakubo,Atsushi Hori,Ichiro Fujiwara,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki Kakushima","Endurance Improvement in Ferroelectric Y-doped HfO2 Thin Films on NiSi2 with Low-Thermal Budget Processing","Solid State Devices and Materials (SSDM2019)",,,,,,2019,Sept.
"Joel Molina-Reyes,Haruki Iwatsuka,Takuya Hoshii,Shun-Ichiro Ohmi,Hiroshi Funakubo,Atsushi Hori,Ichiro Fujiwara,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki Kakushima","NiSi2 as a Promotor of Ferroelectricity in Si-doped HfO2 Thin Films after Low-Thermal Budget Processing","VLSI 2019 (2019 Symposia on VLSI Technology and Circuits)",,,,,,2019,June
"J. Molina,H. Iwatsuka,T. Hoshii,S. Ohmi,H. Funakubo,A. Hori,I. Fujiwara,H. Wakabayashi,K. Tsutsui,K. Kakushima","Ferroelectric Properties of Si doped HfO2 Thin Films with NiSi2 as Bottom Electrode","235th ECS Meeting",,,,,,2019,May