"J. Molina,T. Mimura,Y. Nakamura,T. Shimizu,H. Funakubo,I. Fujiwara,T. Hoshii,S. Ohmi,A. Hori,H. Wakabayashi,K. Tsutsui,K. Kakushima","Interface engineering of BEOL compatible ferroelectric Y:HfO2 device for enhanced endurance","2020 IMW (The 12th International Memory Workshop)",,,,,,2020,May
"Joel Molina-Reyes,Takuya Hoshii,Shun-Ichiro Ohmi,Hiroshi Funakubo,Atsushi Hori,Ichiro Fujiwara,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki Kakushima","NiSi2 as a Bottom Electrode for Enhanced Endurance of Ferroelectric Y-doped HfO2 Thin Films",,"Japanese Journal of Applied Physics",,"Vol. 59","No. SG",,2020,Feb.
"Joel Molina-Reyes,Takuya Hoshii,Shun-Ichiro Ohmi,Hiroshi Funakubo,Atsushi Hori,Ichiro Fujiwara,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki Kakushima","NiSi2 as a Bottom Electrode for Enhanced Endurance of Ferroelectric Y-doped HfO2 Thin Films",,"Jpn. J. Appl. Phys.",,"Vol. 59",,"pp. SGGB06-1-6",2020,Feb.