"Sung-Lin Tsai,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Tien-Kan Chung,Edward Yi Chang,Kuniyuki Kakushima","On the thickness scaling of ferroelectricity in Al0.78Sc0.22N films",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBA05",2021,Apr.
"S-L. Tsai,T. Hoshii,H. Wakabayashi,K. Tsutsui,T-K. Chung,E. Chang,K. Kakushima","Room-temperature deposition of a poling-free ferroelectric AlScN film by reactive sputtering",,"Applied Physics Letters",,"Vol. 118","No. 8","Page 82902",2021,Feb.