"Takuya Hamada,Masaya Hamada,Satoshi Igarashi,Taiga Horiguchi,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET with TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box",,"Journal of the Electron Devices Society (J-EDS)",,"Vol. 9",,"p. 1117",2021,Aug.
"Satoshi Igarashi,Yusuke Mochiduki,Haruki Tanigawa,Masaya Hamada,Kentaro Matsuura,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-Aligned-TiSi2 Bottom Contact with APM Cleaning and Post-annealing for Sputtered-MoS2 Film",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH04",2021,Jan.