"Kazuto Mizutani,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Edward Y. Chang,Kuniyuki Kakushima","Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination",,"Applied Physics Express",,,,,2022,Dec. "Takamasa Kawanago,Ryosuke Kajikawa,Kazuto Mizutani,Sung-Lin Tsai,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Doping-Free Complementary Metal-Oxide-Semiconductor Inverter Based on N-Type and P-Type Tungsten Diselenide Field-Effect Transistors With Aluminum-Scandium Alloy and Tungsten Oxide for Source/Drain Contact",,"IEEE Journal of the Electron Devices Society","IEEE","Vol. 11",,"p. 15-21",2022,Nov. "Shonosuke Kimura,Takuya Hoshii,Kuniyuki Kakushima,Hitoshi Wakabayashi,Kazuo Tsutsui","Performance Improvements of P-channel GaN HFETs by Atomic Layer Etching using Nitrogen Plasma","the International Workshop on Nitride Semiconductors 2022",,,,,,2022,Oct. "…’J ˆêãÄ,¯ˆä ‘ñ–ç,ì“ߎq ‚’¨,@“c ˆÉ—–ç,Žá—Ñ ®,“›ˆä ˆê¶,Šp“ˆ –M”V","Šó“y—ÞŽ_‰»•¨ƒLƒƒƒbƒsƒ“ƒO‚É‚æ‚éY:HfO2ƒLƒƒƒpƒVƒ^‚ÌM—Š«‰ü‘P","‘æ83‰ñ‰ž—p•¨—Šw‰ïH‹GŠwpu‰‰‰ï",,,,,,2022,Sept. "ì“ߎq ‚’¨,Šì —º‰î,…’J ˆêãÄ,Tsai Sung Lin,@“c ˆÉ—–ç,¯ˆä ‘ñ–ç,Šp“ˆ –M”V,“›ˆä ˆê¶,Žá—Ñ ®","ƒAƒ‹ƒ~ƒjƒEƒ€ƒXƒJƒ“ƒWƒEƒ€‡‹à(AlSc)‚ÆŽ_‰»ƒ^ƒ“ƒOƒXƒeƒ“(WOx)‚ðƒ\[ƒX/ƒhƒŒƒCƒ““d‹É‚É—p‚¢‚½WSe2 n/p FET‚ÆCMOSƒCƒ“ƒo[ƒ^‰ž—p","‘æ83‰ñ‰ž—p•¨—Šw‰ïH‹GŠwpu‰‰‰ï",,,,,,2022,Sept. "Sung-Lin Tsai,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Tien-Kan Chung,Edward Yi Chang,Kuniyuki Kakushima","Field cycling behavior and breakdown mechanism of ferroelectric Al0.78Sc0.22N films",,"Japanese Journal of Applied Physics",,,,,2022,Aug. "ˆ¢–ì ‹¿‘¾˜Y,¯ˆä ‘ñ–ç,Žá—Ñ ®,“›ˆä ˆê¶,ˆË“c F,Šp“ˆ –M”V","ƒQ[ƒg•t‚«SiC pnƒ_ƒCƒI[ƒh‚Ì“d‹C“Á«•]‰¿","‘æ83‰ñ‰ž—p•¨—Šw‰ïH‹GŠwpu‰‰‰ï",,,,,,2022,Aug. "Si-Meng Chen,Sung-Lin Tsai,Kazuto Mizutani,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Edward Yi Chang,Kuniyuki Kakushima","GaN high electron mobility transistors (HEMTs) with self-upward-polarized AlScN gate dielectrics toward enhancement-mode operation",,"Japanese Journal of Applied Physics",,,,,2022,July "Atsuki Miyata,T. Hoshii,H. Wakabayashi,K. Tsutsui,K. Kakushima,Takuya Hoshii","Suppression of decay time in transient drain current of back-gated GaN HEMT under UV exposure",,"Japanese Journal of Applied Physics",,,,,2022,July "Ryota Shibukawa,Sung-Lin Tsai,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki Kakushima","Influence of sputtering power on the switching and reliability of ferroelectric Al0.7Sc0.3N films",,"Japanese Journal of Applied Physics",,"Vol. 61","No. SH","pp. SH1003",2022,July "Si-Meng Chen,Sung Lin Tsai,Kazuto Mizutani,Takuya Hoshii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Edward Yi Chang,Kuniyuki KAKUSHIMA","GaN high electron mobility transistors (HEMTs) with self-upward-polarized AlScN gate dielectrics toward enhancement-mode operation",,"Japanese Journal of Applied Physics",,"Volume 61",,,2022,June "M. Nishizawa,T. Hoshii,H. Wakabayashi,K. Tsutsui,Yoshiaki Daigo,Ichiro Mizushima,T. Yoda,K. Kakushima","Minority carrier lifetime extraction methodology based on parallel pn diodes with a field plate",,"Japanese Journal of Applied Physics",,"Vol. 61",," SH1011",2022,June "Takamasa Kawanago,Takahiro Matsuzaki,Ryosuke Kajikawa,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Experimental demonstration of high-gain CMOS inverter operation at low V dd down to 0.5 V consisting of WSe2 n/p FETs",,"Japanese Journal of Applied Physics",,"Vol. 61","No. SC","pp. SC1004",2022,May "Sung-Lin Tsai,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Tien-Kan Chung,Edward Yi Chang,Kuniyuki Kakushima","Field cycling behavior and breakdown mechanism of ferroelectric Al0.78Sc0.22N films",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,May "Ryota Shibukawa,Sung Lin Tsai,Takuya Hoshii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kuniyuki KAKUSHIMA","Influence of sputtering power on the switching and reliability of ferroelectric Al0.7Sc0.3N films",,"Japanese Journal of Applied Physics",,"Volume 61",,,2022,Apr. "Atsuki Miyata,Takuya Hoshii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kuniyuki KAKUSHIMA","Suppression of decay time in transient drain current of back-gated GaN HEMT under UV exposure",,"Japanese Journal of Applied Physics",," 61"," SH"," SH1005",2022,Apr. "Kazuto Mizutani,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Edward Y. Chang,Kuniyuki Kakushima","Cerium oxide capping on Y-doped HfO2 films for ferroelectric phase stabilization with endurance improvement",,"Japanese Journal of Applied Physics",,,,,2022,Feb. "Takamasa KAWANAGO,Takahiro Matsuzaki,Ryosuke Kajikawa,Iriya Muneta,Takuya HOSHII,Kuniyuki Kakushima,Kazuo TSUTSUI,Hitoshi WAKABAYASHI","Experimental demonstration of high-gain CMOS Inverter operation at low Vdd down to 0.5 V consisting of WSe2 n/p FETs",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,Feb. "Kazuto Mizutani,Takuya Hoshii,Hitoshi Wakabayashi,Kazuo Tsutsui,Edward Y. Chang,Kuniyuki Kakushima","Cerium oxide capping on Y-doped HfO2 films for ferroelectric phase stabilization with endurance improvement",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61","No. 2",,2022,Feb.